Screen-printed titanium dioxide anti-reflection coating for silicon solar cells

Szlufcik, J.; Majewski, Jacek; Radojewski, J.; Jȩdral, L.; Radojewska, E. B.

doi:10.1016/0165-1633(89)90040-3

Cited by 21 publications

(10 citation statements)

References 12 publications

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“…This was due to its versatility and low cost. TiO x showed optimal optical properties to act as an antireflection coating between a silicon surface and an Ethylene Vinyl Acetate (EVA) encapsulant film used when packing cells into modules . The ideal refractive index for the top antireflection layer in encapsulated cell is ∼2.1 at λ = 630 nm .…”

Section: Materials and Methods For Silicon Surface Passivationmentioning

confidence: 99%

“…The ideal refractive index for the top antireflection layer in encapsulated cell is ∼2.1 at λ = 630 nm . Deposition of TiO x was performed using either chemical or physical vapour techniques , and its use extended beyond that of the solar industry, most prominently in glass manufacturing as a protection coating deposited using ultra‐high throughput techniques . Despite its ideal optical properties, TiO x was replaced by hydrogenated silicon nitride (SiN x ) since the evolution of silicon solar cells required appropriate passivation of the cells front surface, and this could not be accomplished using TiO x .…”

Section: Materials and Methods For Silicon Surface Passivationmentioning

confidence: 99%

See 1 more Smart Citation

Dielectric surface passivation for silicon solar cells: A review

Bonilla

Hoex

Hamer

et al. 2017

Physica Status Solidi (a)

227

161

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This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.Silicon wafer solar cells continue to be the leading photovoltaic technology, and in many places are now providing a substantial portion of electricity generation. Further adoption of this technology will require processing that minimises losses in device performance. A fundamental mechanism for efficiency loss is the recombination of photo-generated charge carriers at the unavoidable cell surfaces. Dielectric coatings have been shown to largely prevent these losses through a combination of different passivation mechanisms. This review aims to provide an overview of the dielectric passivation coatings developed in the past two decades using a standardised methodology to characterise the metrics of surface recombination across all techniques and materials. The efficacy of a large set of materials and methods has been evaluated using such metrics and a discussion on the current state and prospects for further surface passivation improvements is provided.

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Section: Materials and Methods For Silicon Surface Passivationmentioning

confidence: 99%

Section: Materials and Methods For Silicon Surface Passivationmentioning

confidence: 99%

Dielectric surface passivation for silicon solar cells: A review

Bonilla

Hoex

Hamer

et al. 2017

Physica Status Solidi (a)

227

161

View full text Add to dashboard Cite

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“…119 No etching of spray-and APCVD-deposited TiO 2 films have been observed during a 5 min cleaning step with boiling H 2 SO 4 :H 2 O 2 (1:5). 90 The reported resistance of TiO 2 versus other acids such phosphoric acid (H 3 PO 4 ), 115,119 nitric acid (HNO 3 ), 115 and HCl 21,94,115,122 all follow the trend of increased resistance at higher deposition or annealing temperatures.…”

Section: Chemical Resistance Of Tiomentioning

confidence: 96%

“…98 While other researchers have previously observed that oxygen is capable of diffusing through TiO 2 thin films to form an interfacial SiO 2 layer, the formation of an interfacial layer was not capitalised upon. 88,122,128 A scanning electron microscopy (SEM) image of a sample that has undergone an oxidation step after TiO 2deposition is shown in Figure 12. Confirmation that the interfacial layer is indeed SiO 2 was obtained by X-ray photoelectron spectrometry (XPS) analysis.…”

Section: Chemical Resistance Of Tiomentioning

confidence: 99%

Comparison of TiO₂ and other dielectric coatings for buried‐contact solar cells: a review

Richards

2004

Progress in Photovoltaics

189

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This paper compares the optical, electronic, physical and chemical properties of dielectric thin films that are commonly used to enhance the performance of bulk silicon photovoltaic devices. The standard buried‐contact (BC) solar cell presents a particularly challenging set of criteria, requiring the dielectric film to act as: (i) an anti‐reflection (AR) coating; (ii) a film compatible with surface passivation; (iii) a mask for an electroless metal plating step; (iv) a diffusion barrier for achieving a selective emitter; (v) a film with excellent chemical resistance; (vi) a stable layer during high‐temperature processing. The dielectric coatings reviewed here include thermally grown silicon dioxide (SiO2), silicon nitride deposited by plasma‐enhanced chemical vapour deposition (a‐SiNx:H) and low‐pressure chemical vapour deposition (Si3N4), silicon oxynitride (SiON), cerium dioxide (CeO2), zinc sulphide (ZnS), and titanium dioxide (TiO2). While TiO2 dielectric coatings exhibit the best optical performance and a simple post‐deposition surface passivation sequence has been developed, they require an additional sacrificial diffusion barrier to survive the heavy groove diffusion step. A‐SiNx:H affords passivation through its high fixed positive charge density and large hydrogen concentration; however, it is difficult to retain these electronic benefits during lengthy high‐temperature processing. Therefore, for the BC solar cell, Si3N4 films would appear to be the best choice of dielectric films common in industrial use. Copyright © 2004 John Wiley & Sons, Ltd.

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“…In recent years, titanium dioxide thin and thick films have found many applications because of their chemical stability, non-toxicity and possession of unique optical characteristics; such as good photocatalytic activity, high melting point, and high reflective index wide direct-bandgap, which means high transmittance in the visible and near-IR regions. For example, in the last two decades, TiO 2 films have been used extensively as anode in dye sensitized solar cells [1], as a photocatalyst [2], an antireflection coating in silicon solar cells [3] and a gas sensor [4]. TiO 2 has been prepared using physical thermal vapor deposition [5], chemical bath deposition [6], chemical spray pyrolysis [7], hydrothermal method [8], etc.…”

Section: Introductionmentioning

confidence: 99%

Structural Properties of Fe Doped TiO2 Nanorods Prepared by Low Cost Hydrothermal Method

Hashim¹,

Hassoon²,

Salman³

2020

ETJ

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In this work, titanium dioxide films were deposited on fluorine tin oxide (FTO)-glass substrates using Hydrothermal method. A low-cost homemade autoclave was used to fabricate pure TiO2 and Fe-doped (0.1%, 0.3%, 0.5%, 0.7% and 1.5%) films. X-ray diffraction patterns showed that the predominant phase is rutile (R-TiO2) with peaks at (101), (002) and (112). The Field Emission Scanning Electron Microscope (FESEM) top and cross-sectional images indicated that the films have vertically aligned nanorods structures with parallelogram cross-sectional areas and aspect ratio range (9.2-15.3).

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Screen-printed titanium dioxide anti-reflection coating for silicon solar cells

Cited by 21 publications

References 12 publications

Dielectric surface passivation for silicon solar cells: A review

Dielectric surface passivation for silicon solar cells: A review

Comparison of TiO₂ and other dielectric coatings for buried‐contact solar cells: a review

Structural Properties of Fe Doped TiO2 Nanorods Prepared by Low Cost Hydrothermal Method

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Screen-printed titanium dioxide anti-reflection coating for silicon solar cells

Cited by 21 publications

References 12 publications

Dielectric surface passivation for silicon solar cells: A review

Dielectric surface passivation for silicon solar cells: A review

Comparison of TiO2 and other dielectric coatings for buried‐contact solar cells: a review

Structural Properties of Fe Doped TiO2 Nanorods Prepared by Low Cost Hydrothermal Method

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Comparison of TiO₂ and other dielectric coatings for buried‐contact solar cells: a review