2003
DOI: 10.1021/la034858o
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Scanning Probe Contact Printing

Abstract: This paper reports a scanning probe contact printing (SP-CP) method for generating submicron patterns. It uses a novel scanning probe with an integrated elastomeric tip to transfer chemical materials onto a substrate. The SP-CP method combines the advantages of microcontact printing and dip-pen nanolithography to generate monolayer features chemisorbed on a gold surface. Arbitrary, connected features such as lines or blocks can be formed by connecting multiple dots, analogous to dot-matrix printing. We discuss… Show more

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Cited by 77 publications
(56 citation statements)
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“…The scanning probe contact printing (SP-CP) method was proposed to allow one to make micro-and nanoscale features with excellent alignment registration capabilities based on a novel scanning probe microscope (SPM) with an integrated elastomeric tip, as shown in Fig. 20 [214].…”
Section: Nanoprintingmentioning
confidence: 99%
“…The scanning probe contact printing (SP-CP) method was proposed to allow one to make micro-and nanoscale features with excellent alignment registration capabilities based on a novel scanning probe microscope (SPM) with an integrated elastomeric tip, as shown in Fig. 20 [214].…”
Section: Nanoprintingmentioning
confidence: 99%
“…4.11). Many derivative technologies to DPN have been developed including electrochemical DPN (EDPN) [62], nanopen reader and writer (NPRW) [63], scanning probe contact printing (SP-CP) [64], polymer pen lithography (PPL) [65], and nanofountain pen (NFP) [66]. Tip-based direct write methods have been used in concert with multiple biological substance including synthetic and organic polymers, proteins and enzymes, DNA, and cells.…”
Section: Tip-based Direct Writingmentioning
confidence: 99%
“…The current fabrication techniques (i.e., liftoff, dry and wet etching processes) used in micro and nanolithographic approaches (such as ultra-violet, electronbeam, x-ray, and ion-beam lithographies) involve gases (for instance, oxygen, and nitrogen), DI water, and/or chemical solution (such as photoresist and acetone), making them improper to pattern conducting polymers. Nonphotolithographic approaches like dip-pen lithography (Piner et al 1999;Wang et al 2003), soft lithography (Xia and Whitesides 1998;Xia et al 1999), and nanoimprint lithography (NIL) method (Chou et al 1996a, b) are potential approaches to make conducting polymer features since these methods do not involve those degrading factors. Dip-pen lithography uses an atomic force microscope to ''write'' patterns on the substrate.…”
Section: Fabrication Of Conducting Polymer Nanopatterns Using the Eximentioning
confidence: 99%