2021
DOI: 10.1016/j.optlaseng.2020.106503
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Scanning ion beam etching: A method for the fabrication of computer-generated hologram with nanometric accuracy for aspherical testing

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Cited by 8 publications
(3 citation statements)
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“…e navigation field is constructed as a circle. e center position of the circle is the position of the navigation beacon, and the radius is confirmed by combining the boundary extraction results and the ship-navigation beacon collision experiment results [20].…”
Section: Analysis Of the Constructionmentioning
confidence: 75%
“…e navigation field is constructed as a circle. e center position of the circle is the position of the navigation beacon, and the radius is confirmed by combining the boundary extraction results and the ship-navigation beacon collision experiment results [20].…”
Section: Analysis Of the Constructionmentioning
confidence: 75%
“…The design parameters included a duty cycle of 0.5 and an etching depth of 400 nm. They were manufactured using laser direct writing and scanning ion beam etching [19].…”
Section: Experimental Verification and Discussionmentioning
confidence: 99%
“…The excellent mechanical property and chemical stability of SiC make it difficult to perform micro‐fabrication process such as etching. Current SiC etching technologies include reaction ion etching, 4 inductively couple plasma etching, 5 magnetic neutral loop discharge plasma etching 6 et al. SF 6 , 7 CF 4 8 , CHF 3 , 9 NF 3 , 10 and Cl 2 11 are commonly used as etching gases.…”
Section: Introductionmentioning
confidence: 99%