2007
DOI: 10.1021/nn7000799
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Scanning Electron Microscopy of Nanoscale Chemical Patterns

Abstract: A series of nanoscale chemical patterning methods based on soft and hybrid nanolithographies have been characterized using scanning electron microscopy with corroborating evidence from scanning tunneling microscopy and lateral force microscopy. We demonstrate and discuss the unique advantages of the scanning electron microscope as an analytical tool to image chemical patterns of molecules highly diluted within a host self-assembled monolayer and to distinguish regions of differential mass coverage in patterned… Show more

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Cited by 74 publications
(123 citation statements)
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“…We have previously shown that the SEM is sensitive to exposed chemical functionality and chemical patterns. 47 ■ RESULTS AND DISCUSSION Infrared Spectroscopy of Printed Films. Infrared reflectance adsorption spectroscopy (IRRAS) is an ensemble technique used to determine SAM structural and compositional details.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…We have previously shown that the SEM is sensitive to exposed chemical functionality and chemical patterns. 47 ■ RESULTS AND DISCUSSION Infrared Spectroscopy of Printed Films. Infrared reflectance adsorption spectroscopy (IRRAS) is an ensemble technique used to determine SAM structural and compositional details.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…Functionalization of chemically patterned surfaces adds new degrees of utility by enabling surface reactivity to be patterned at the nanometer scale. This has led to nanoscale films being used as biocompatible/bioactive scaffolds, molecular-sized electronic components, selective molecular resists, and other types of surfaces where both patterned structure and molecular interactions are necessary (Chen et al 1997;Xia and Whitesides 1998a;Smith et al 2004;Srinivasan et al 2007). As processes are developed for creating such chemical patterns, metrology tools and methods must be developed in lockstep in order to follow the patterning steps and to optimize the quality of the surfaces obtained.…”
Section: Chemically Patterned Surfacesmentioning
confidence: 99%
“…As processes are developed for creating such chemical patterns, metrology tools and methods must be developed in lockstep in order to follow the patterning steps and to optimize the quality of the surfaces obtained. These metrology methods remain in their infancy (Allara and Nuzzo 1985;Porter et al 1987;Nuzzo et al 1990;Lopez et al 1993;Pertsin and Grunze 1994;Lahiri et al 1999a;Srinivasan et al 2007;Mrksich 2008).…”
Section: Chemically Patterned Surfacesmentioning
confidence: 99%
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