Scanning digital oil immersion lithography providing high-speed large area patterning with diffraction limited sub-micron resolution

Jakkinapalli, Aravind; Bhaskar, Arun; Wen, Sy-Bor

doi:10.1088/1361-6439/abc31f

Cited by 4 publications

(2 citation statements)

References 19 publications

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“…However, its application is restricted by high-cost equipment, stringent requirements of the use environment, and limited availability of suitable materials. New lithography technologies have been investigated, which include immersion lithography [95], extreme UV lithography [96,97], EBL [98,99], nanoimprint lithography (NIL) [100][101][102], laser direct write lithography [103,104], and focused ion beam lithography [105,106]. Shen et al [107] combined standard photolithography with reactive ion etching (RIE) to produce a tinted liquid crystal integrated metalens.…”

Section: Lithography-based Fabricationmentioning

confidence: 99%

Progress in design, nanofabrication and performance of metalenses

WANG

et al. 2021

J. Opt.

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Metalens has been shown to overcome the diffraction limit of conventional optical lenses to achieve sub-wavelength resolution. Due to its planar structure and lightweight, metalens has the potential applications in the manufacture of flat lenses for cameras and other high resolution imaging optics. However, currently reported metalenses have low focusing efficiencies: 26% - 68% in THz and GHz range, 1% - 91% in near infrared range (NIR), and 5% - 91.6% in the visible range. Far field imaging in the visible light is essential for use in camera and mobile phones, which requires a complex metalens structure with multi-layers of alternating metal and dielectric layers. Most of the reported metalenses work in a single wavelength, mainly due to the high dispersion characteristics of the diffractive metalenses. It remains a challenge to realize high resolution imaging for a wide wavelength band in particular in the visible range. In this review, we report the state-of-the-art in metalens design principle, types of nanoscale structures, and various fabrication processes. We introduce femtosecond laser direct writing based on two-photon polymerization as an emerging nanofabrication technology. We provide an overview of the optical performance of the recently-reported metalenses and elaborate the major research and engineering challenges and future prospects.

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Section: Lithography-based Fabricationmentioning

confidence: 99%

Progress in design, nanofabrication and performance of metalenses

WANG

et al. 2021

J. Opt.

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“…Several lithography techniques have been proposed for nanofabrication purposes to achieve a high resolution. For example, immersion lithography [9] may be used to reduce the period of the resulting structure by improving the refractive index. Extreme ultraviolet lithography [10] and X-ray lithography [11] have improved the resolution of the resulting structures by shortening the wavelength.…”

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confidence: 99%

Theoretical investigation of two-dimensional sub-wavelength structures fabricated by multi-beam surface plasmon interference lithography

Wang¹,

Jia²,

Ren³

et al. 2021

EPL

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In this study, multi-beam surface plasmon (SP) interference lithography was theoretically proposed and demonstrated to fabricate periodic two-dimensional sub-wavelength structures. The lithography structures were based on an attenuated total reflection prism used to excite the SPs using a 442 nm laser. Circular lattices with periods of 166 and 288 nm were successfully obtained via three- and six-beam SP interference lithography, respectively; these lattices exhibited an identical feature size of 96 nm. Square dot arrays with a 177 nm period and 88.5 nm spot size were obtained by four-beam SP interference lithography. The proposed lithography technology has a simple structure and is economical; further, it may provide an effective method for the fabrication of two-dimensional sub-wavelength structures.

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Direct writing immersion laser lithography on graphene monolayers using two-photon absorption

Zhang,

Strobel,

Estel

et al. 2023

Journal of Vacuum Science &Amp; Technology B

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Direct writing laser lithography has become increasingly attractive due to its mask-free nature, offering significant design flexibility and minimizing additional costs associated with new exposure masks. Among the various direct laser writing techniques, two-photon absorption direct laser writing stands out for its ability to fabricate very small features through nonlinear optical effects. Operating this technique in immersion, where the air gap between the lens and photoresist or probe is liquid-filled, has been shown to enable reduced feature sizes [D. P. Sanders, Chem. Rev. 110, 321 (2010).]. Previous studies have typically employed an immersion oil for this purpose [Jakkinapalli et al., J. Micromech. Microeng. 30, 125014 (2020).]. However, our experiments revealed that prolonged immersion times can lead to oil interacting with the photoresist, resulting in the formation of new compounds that are challenging to remove. Consequently, the altered photoresist becomes unresponsive to both exposure and development. In light of these findings, we conducted tests using alternative immersion liquids and propose a combination of different immersion liquids and air direct writing as a means to achieve optimal writing results.

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Scanning digital oil immersion lithography providing high-speed large area patterning with diffraction limited sub-micron resolution

Cited by 4 publications

References 19 publications

Progress in design, nanofabrication and performance of metalenses

Progress in design, nanofabrication and performance of metalenses

Theoretical investigation of two-dimensional sub-wavelength structures fabricated by multi-beam surface plasmon interference lithography

Direct writing immersion laser lithography on graphene monolayers using two-photon absorption

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