Laser-Induced Damage in Optical Materials: 2015 2015
DOI: 10.1117/12.2194083
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Scaling of laser-induced contamination growth at 266nm and 355nm

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Cited by 6 publications
(5 citation statements)
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“…These processes were described in the UV (355 nm) and more recent studies have shown an even growing importance of LIC in the deep UV (266 nm). 48 In our case the self-limiting vertical growth of LIC 15 deposit could also be caused by absorption, possibly by two-photon absorption in the deep UV because of the short pulse duration and high intensity.…”
Section: Dynamics Of Lic Formationmentioning
confidence: 60%
“…These processes were described in the UV (355 nm) and more recent studies have shown an even growing importance of LIC in the deep UV (266 nm). 48 In our case the self-limiting vertical growth of LIC 15 deposit could also be caused by absorption, possibly by two-photon absorption in the deep UV because of the short pulse duration and high intensity.…”
Section: Dynamics Of Lic Formationmentioning
confidence: 60%
“…Both the porosity and the availability of possible reaction sites on the surface are important [23,24]. Even catalytic properties of defects have been discussed [26], in line with the observation that coatings with high internal strain are more strongly contaminated than uncoated substrates [6,27,28].…”
Section: Introductionmentioning
confidence: 82%
“…On the other hand, also the wavelength might play a role. Light at 266 nm is resonant both to electronic transitions in aromatic hydrocarbons and non-bonding oxygen hole center-defects (NBOHC) in strained silica films [6,25,41]. Hence, we might excite both the contaminating particles and the possible reaction sites very effectively [6].…”
Section: Discussionmentioning
confidence: 99%
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“…Here, it was shown that the presence of oxygen allows for an efficient suppression of LIC effects on the coatings of high-energy UV laser systems [27][28][29]. Furthermore, investigations on the effect of LIC in combination with 266 nm radiation have also been performed in-house [30]. Several critical components of the MOMA LH have been tested regarding their potential for the growth of contamination, namely the electrical cables, the electrical connector, samples of heat shrink tube, the foil heaters as well as the adhesive used for screw securing.…”
Section: Beam Deflection Laser Housing and Interface Opticsmentioning
confidence: 99%