2014
DOI: 10.1088/1742-6596/494/1/012002
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Scaling influence on the thermal behavior of toward-THz SiGe:C HBTs

Abstract: Abstract. An extensive on-wafer experimental campaign is performed to extract the thermal resistance of state-of-the-art toward-THz silicon germanium bipolar transistors designed and developed within the European DOTFIVE project. The dependence of this critical parameter on scaling, as well as on the emitter layout, is carefully evaluated, and the resulting junction temperatures are determined. IntroductionSilicon germanium (SiGe) bipolar technology is increasingly adopted in a large variety of mm-wave and nea… Show more

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(2 citation statements)
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“…The temperature T j is in turn dependent upon V BE and V CB via (13), (14), and therefore R EB can be considered as a function of V BE and V CB ; by differentiating,…”
Section: A Collector Currentmentioning
confidence: 99%
See 1 more Smart Citation
“…The temperature T j is in turn dependent upon V BE and V CB via (13), (14), and therefore R EB can be considered as a function of V BE and V CB ; by differentiating,…”
Section: A Collector Currentmentioning
confidence: 99%
“…Here the aim is to extend the analysis sketched in [14] to offer an in-depth understanding of the impact of scaling and emitter geometry on the self-heating (SH) in SiGe:C HBTs; this is achieved by means of simple dc measurements carried out on state-of-the-art transistors realized within the DOTFIVE framework. The paper is organized as follows.…”
Section: Introductionmentioning
confidence: 99%