Proceedings of the IEEE 2013 Custom Integrated Circuits Conference 2013
DOI: 10.1109/cicc.2013.6658450
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Scaling challenges of NAND flash memory and hybrid memory system with storage class memory & NAND flash memory

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Cited by 12 publications
(2 citation statements)
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“…The intersection of a control gate plate with a pillar identifies a single memory cell; each string is connected to a bitline through an upper select transistor (BLS). The bottom of the Bit density can be increased by adding more control gate plates [10,11], while the number of the critical lithography steps remains constant because the whole stack of control gates is completely punched through with one lithography step only. It is worth highlighting the fact that the body of the vertical transistor is completely made of polysilicon; in fact, the aspect ratio of the punched hole is so high that it becomes almost impossible to achieve good production yield without non-selective deposition process steps.…”
Section: Bicsmentioning
confidence: 99%
“…The intersection of a control gate plate with a pillar identifies a single memory cell; each string is connected to a bitline through an upper select transistor (BLS). The bottom of the Bit density can be increased by adding more control gate plates [10,11], while the number of the critical lithography steps remains constant because the whole stack of control gates is completely punched through with one lithography step only. It is worth highlighting the fact that the body of the vertical transistor is completely made of polysilicon; in fact, the aspect ratio of the punched hole is so high that it becomes almost impossible to achieve good production yield without non-selective deposition process steps.…”
Section: Bicsmentioning
confidence: 99%
“…As the CMOS technology scales down to the 22-nm node, conventional memories are confronted with scalability problem [9], [10]. Thus, the STT-RAM with great scalability is widely researched as a next-generation memory.…”
Section: Introductionmentioning
confidence: 99%