2017
DOI: 10.1126/science.aaj1628
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Scaling carbon nanotube complementary transistors to 5-nm gate lengths

Abstract: High-performance top-gated carbon nanotube field-effect transistors (CNT FETs) with a gate length of 5 nanometers can be fabricated that perform better than silicon complementary metal-oxide semiconductor (CMOS) FETs at the same scale. A scaling trend study revealed that the scaled CNT-based devices, which use graphene contacts, can operate much faster and at much lower supply voltage (0.4 versus 0.7 volts) and with much smaller subthreshold slope (typically 73 millivolts per decade). The 5-nanometer CNT FETs … Show more

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Cited by 576 publications
(443 citation statements)
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References 44 publications
(64 reference statements)
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“…To have a better understanding about the electrical properties of this SWNT device, the drain current ( I D ) versus gate voltage ( V G ) are measured at different gate voltages in ambient conditions 1, 29, 30. In all devices we have measured (≈89), there are two types of SWNTs: semiconducting and metallic SWNTs as indicated by the V G modulation of the I D .…”
Section: Resultsmentioning
confidence: 99%
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“…To have a better understanding about the electrical properties of this SWNT device, the drain current ( I D ) versus gate voltage ( V G ) are measured at different gate voltages in ambient conditions 1, 29, 30. In all devices we have measured (≈89), there are two types of SWNTs: semiconducting and metallic SWNTs as indicated by the V G modulation of the I D .…”
Section: Resultsmentioning
confidence: 99%
“…Continuation of Moore's law to the sub‐10‐nm scale requires the development of new technologies for creating electrode nanogaps, in architectures which allow a third electrostatic gate 1, 2, 3, 4. Nanogap engineering of low‐dimensional nanomaterials has the potential to fulfill this need, provided their structures and properties at the moment of gap formation could be controlled, which has been of emerging interest in a variety of fields, ranging from molecular electronics to memories 2, 5, 6, 7, 8, 9, 10.…”
Section: Introductionmentioning
confidence: 99%
“…The approximate transmission probability T s app (E) based on (4) and (6) is used in region 2 if there is only one potential barrier.…”
Section: S(d)mentioning
confidence: 99%
“…where the subthreshold slope SS = (d log 10 I/dV gs ) −1 can be approximated by simple expressions including fitting parameters [8], [12], [30], [31] or extracted from either the experimental data [3], [4] or numerical calculations [15]. The subthreshold current, I sub , is smoothly connected to the TFE current at V F B .…”
Section: Devicesmentioning
confidence: 99%
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