“…The transistors are operated by grounding the source and applying a drain voltage; among those, the source normally utilizes multiple low-dimensional materials such as a graphene–Si junction, metal–Si Schottky junction, or graphene–semiconductor heterojunction to offer several unique advantages (e.g., ultrathin, medium price, fabrication at room temperature, and good stability) for the design of next-generation transistors (Table ). ,,,,,,,,,,,− In recent advances, there are some typical transistor types such as the FET (Figure ), tunnel-field-effect transistor (TFET) (Figure ), high-speed transistor, HETs, vertical molecular tunneling transistor, gas-channel and ion-channel transistors, ferroelectric field-effect transistors, negative capacitance field-effect transistors (NC-FETs), and barristors (Figure ).…”