Scalable fabrication of flexible multi-level nanoimprinting molds with uniform heights via a ‘top-to-bottom’ level patterning sequence

Choi, Sung-Woo; Kook, Yun Ho; Kim, Chul Ho; Yoo, Soon Sung; Park, Kwon Shik; Lee, Jinhyung; Park, Changsu; Ok, Jong G.; Kang, Shinill

doi:10.1016/j.apsusc.2017.09.172

Cited by 3 publications

(1 citation statement)

References 15 publications

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“…As the size of the devices decreases to nanoscale, some conventional techniques, with limitations set by optical diffraction and scattering, cannot fulfill the requirements. Nanoimprinting is a revolutionary approach, which not only has demonstrated being of high resolution up to nanometer feature size but also provided low cost and high throughput nanopatterns over a large area, becoming a promising candidate for the next generation lithography technologies [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17]. This technique is developed by pressing a hard master mold to penetrate into the surface of a substrate such as on a soft polymer originally [10,11] then metals using diamond or SiC molds [15][16][17] and carbon nanotubes (CNTs) [18][19][20] which can transfer high-density patterns into metal thin films.…”

Section: Introductionmentioning

confidence: 99%

Atomistic simulations on nanoimprinting of copper by aligned carbon nanotube arrays under a high-frequency mechanical vibration

Xia

Yang

et al. 2019

Nanotechnology

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Nanoimprinting behaviors of copper substrates and double-walled carbon nanotubes with interwall sp 3 bonds are investigated using molecular dynamics simulations. A high-frequency mechanical vibration with various amplitudes is applied on the carbon nanotube (CNT) mold and copper substrate in different directions. Results show that exciting mechanical resonances both on the CNT and substrate drastically decrease the maximum imprint force and interfacial friction up to 50% under certain amplitudes. Meanwhile, it is demonstrated that defects occur in the {111} plane in the copper substrate during nanoimprinting. For different CNT array densities, a higher grafting density needs more imprint force to transfer patterns. The maximum imprint force for a large range of CNT array densities can be reduced by vibrational perturbations, while reduction rates depend on the CNT grafting density. This work sheds deep insights into the nanoimprint process at the atomic level, suggesting that vibration perturbation is an effective approach for improving the nanoimprinting accuracy and preventing the fracture of nanopatterns.

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Section: Introductionmentioning

confidence: 99%

Atomistic simulations on nanoimprinting of copper by aligned carbon nanotube arrays under a high-frequency mechanical vibration

Xia

Yang

et al. 2019

Nanotechnology

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Formation of nanopore and nanopillar patterned polymer films from mixed PAA-PI solutions by phase separation method

Han

Kim

et al. 2019

Molecular Crystals and Liquid Crystals

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Nanofabrication Techniques: Challenges and Future Prospects

Tahir

Shim

Kamran

et al. 2021

j nanosci nanotechnol

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Nanofabrication of functional micro/nano-features is becoming increasingly relevant in various electronic, photonic, energy, and biological devices globally. The development of these devices with special characteristics originates from the integration of low-cost and high-quality micro/nano-features into 3D-designs. Great progress has been achieved in recent years for the fabrication of micro/nanostructured based devices by using different imprinting techniques. The key problems are designing techniques/approaches with adequate resolution and consistency with specific materials. By considering optical device fabrication on the large-scale as a context, we discussed the considerations involved in product fabrication processes compatibility, the feature’s functionality, and capability of bottom-up and top-down processes. This review summarizes the recent developments in these areas with an emphasis on established techniques for the micro/nano-fabrication of 3-dimensional structured devices on large-scale. Moreover, numerous potential applications and innovative products based on the large-scale are also demonstrated. Finally, prospects, challenges, and future directions for device fabrication are addressed precisely.

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Scalable fabrication of flexible multi-level nanoimprinting molds with uniform heights via a ‘top-to-bottom’ level patterning sequence

Cited by 3 publications

References 15 publications

Atomistic simulations on nanoimprinting of copper by aligned carbon nanotube arrays under a high-frequency mechanical vibration

Atomistic simulations on nanoimprinting of copper by aligned carbon nanotube arrays under a high-frequency mechanical vibration

Formation of nanopore and nanopillar patterned polymer films from mixed PAA-PI solutions by phase separation method

Nanofabrication Techniques: Challenges and Future Prospects

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