2021
DOI: 10.1016/j.bios.2020.112829
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Sapphire-supported nanopores for low-noise DNA sensing

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Cited by 10 publications
(15 citation statements)
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“…Nevertheless, the chip capacitance of only ∼1.5 pF was close to the theoretical calculation of the whole chip (C chip ), taking into account the estimated capacitances from both the 250 μm sapphire substrate (C sub , 1.4 pF) and the sapphire cavity (C slope , 0.2 pF). 16 This also agrees with the fact that the small membrane now contributed only minimal capacitance (C m ). Moreover, it is also worth noting that this measured capacitance is one of the lowest values reported so far (e.g., 1.9−5.8 pF9, 0.69−1.65 pF 12 , 2.2 pF 13 , 2 pF 15 ).…”
Section: Membrane Size Uniformity Studysupporting
confidence: 82%
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“…Nevertheless, the chip capacitance of only ∼1.5 pF was close to the theoretical calculation of the whole chip (C chip ), taking into account the estimated capacitances from both the 250 μm sapphire substrate (C sub , 1.4 pF) and the sapphire cavity (C slope , 0.2 pF). 16 This also agrees with the fact that the small membrane now contributed only minimal capacitance (C m ). Moreover, it is also worth noting that this measured capacitance is one of the lowest values reported so far (e.g., 1.9−5.8 pF9, 0.69−1.65 pF 12 , 2.2 pF 13 , 2 pF 15 ).…”
Section: Membrane Size Uniformity Studysupporting
confidence: 82%
“…22 This makes the etched profile in sapphire pretty complex and not only associated with the sapphire crystal plane but also significantly affected by the mask alignment. 16 Here, within this unique design regime (α from 10 to 35°), the formed triangular membrane sides were parallel to that of the hexagonal etching window instead of staying at a constant crystal plane, yielding a membranewindow angle offset γ ∼ 0°(Figure 2d, shadowed regime, denoted as MPW triangle). This indicates that multiple slowetch-rate sapphire crystal planes were involved and the mask alignment strongly impacts the etched profile within this alignment angle range.…”
Section: Membrane Geometry Control By the Etching Window Layoutmentioning
confidence: 95%
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“…147 This may be important for the fabrication of nanopore devices with integrated electrodes. 40,74,148 Given the generalisability of this technique, one might anticipate seeing CBD extended to different dielectric materials such as sapphire 149 and Al 2 O 3 52,53 in the coming years.…”
Section: Advantages Of Controlled Breakdownmentioning
confidence: 99%