Round-robin measurements of the laser-induced damage threshold with sub-picosecond pulses on optical single layers

Lamaignère, Laurent; Ollé, Alexandre; Chorel, Marine; Roquin, Nadja; Kozlov, A. A.; Hoffman, Brittany N.; Oliver, J. B.; Demos, Stavros G.; Gallais, Laurent; Negres, Raluca A.; Melninkaitis, Andrius

doi:10.1117/1.oe.60.3.031005

Cited by 8 publications

(4 citation statements)

References 27 publications

(39 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…where denotes the largest achievable aperture of the current grating manufacturing technology, is the intrinsic LIDT [ 41 ] , is the AOI and is defined as the energy scaling factor. Here, and are typically constant with the selected material and manufacturing conditions.…”

Section: Discussionmentioning

confidence: 99%

All- and mixed-dielectric grating for Nd:glass-based high-energy pulse compression

Han,

Cao,

Kong

et al. 2023

High Pow Laser Sci Eng

View full text Add to dashboard Cite

Maximizing the energy-loading performance of gratings is a universal theme in high-energy pulse compression. However, sporadic grating designs strongly restrict the development of high-power laser engineering. This study proposes an all- and mixed-dielectric grating design paradigm for Nd:glass-based pulse compressors. The solution regions are classified according to the line density. High diffraction efficiency solutions are described in more detail based on the dispersion amount and incident angle. Moreover, an energy scaling factor of 7.09 times larger than that of the National Ignition Facility’s Advanced Radiographic Capability (NIF-ARC) is obtained by taking advantage of the low electric field intensity at transverse magnetic polarization and a small incident angle. These results make a pioneering contribution to facilitate future 20–50-petawatt-class ultrafast laser systems.

show abstract

Section: Discussionmentioning

confidence: 99%

All- and mixed-dielectric grating for Nd:glass-based high-energy pulse compression

Han,

Cao,

Kong

et al. 2023

High Pow Laser Sci Eng

View full text Add to dashboard Cite

show abstract

“…Refractive index is 1.93 determined at 1053 nm with spectrophotometry. [38] The Nb 2 O 5 monolayer was deposited on fused silica substrate with magnetron sputtering process controlled by HELIOS system. [39] The refractive index was determined by spectrophotometry to be 2.26 at 1030 nm wavelength.…”

Section: B Tested Samplesmentioning

confidence: 99%

Beam-size effects on the measurement of sub-picosecond intrinsic laser induced damage threshold of dielectric oxide coatings

et al. 2021

Self Cite

View full text Add to dashboard Cite

Laser-induced damage experiments on HfO2 and Nb 2 O 5 thin films were performed with 500 fs pulse duration at 1030 nm wavelength. Threshold fluences as a function of beam size have been determined for effective beam diameters ranging from 40 to 220 µm, in single shot regime. The results suggest no beam size effect related to material properties in the investigated range, but size effects related to the metrology. The results indicate the importance of appropriate focusing conditions and beam measurement to qualify the optics for use in lasers with large beam sizes.

show abstract

“…[18][19][20][21][22] In the past decade, mirrors based on the combination of HfO 2 , a high-refractive-index material, and SiO 2 , a low-refractive-index material, received considerable attention. 6,23,24 However, the published sub-picosecond (ps) LIDT results for Sc 2 O 3 or Y 2 O 3 films, indicate that sesquioxides might be good alternatives for HfO 2 . 11,[25][26][27] Especially Sc 2 O 3 , which is a promising high-refractive-index material that exhibits slightly larger optical bandgap (5.7 eV) 28 than HfO 2 (5.55 eV).…”

Section: Introductionmentioning

confidence: 99%

Sub-picosecond 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxide thin films

et al. 2022

Self Cite

View full text Add to dashboard Cite

Dielectric sesquioxide films (Sc 2 O 3 , Y 2 O 3 , and Lu 2 O 3 ) were fabricated by pulsedlaser deposition and tested in terms of their laser damage properties for pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with magnetron-sputtered thin films of established optical-coating materials (SiO 2 , HfO 2 , and Nb 2 O 5 ), whose results served as a benchmark. The laser-induced damage thresholds of the sesquioxides are comparable to each other, and in the multi-pulse test regime show values close to ones of HfO 2 coatings. A lower damage threshold was observed for the polycrystalline Lu 2 O 3 film grown on sapphire compared to single-crystal Lu 2 O 3 grown on yttrium aluminium garnet (Y 3 Al 5 O 12 ), attributed to the highly textured morphology and potential for a greater density of defect states in these films. We conclude that pulsed-laser deposition is a potential fabrication method of sesquioxides for use in high-power resistant optical components for ultrashort-pulse lasers. © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

show abstract

Round-robin measurements of the laser-induced damage threshold with sub-picosecond pulses on optical single layers

Cited by 8 publications

References 27 publications

All- and mixed-dielectric grating for Nd:glass-based high-energy pulse compression

All- and mixed-dielectric grating for Nd:glass-based high-energy pulse compression

Beam-size effects on the measurement of sub-picosecond intrinsic laser induced damage threshold of dielectric oxide coatings

Sub-picosecond 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxide thin films

Contact Info

Product

Resources

About