2022
DOI: 10.1063/5.0074478
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Room temperature optically pumped GeSn microdisk lasers

Abstract: GeSn alloys are promising materials for light emitters monolithically grown on silicon. In this work, we demonstrate room temperature (RT) lasing in a GeSn hetero-structure with 17.2% of Sn. We report a threshold of 3.27 MW cm−2 at 305 K with peak emission at 353 meV. We ascribe these improvements to a higher tin concentration in the GeSn active layer with lower Sn content barriers on each side and to a better thermal dissipation provided by an adapted pedestal architecture beneath the GeSn micro-disk. This ou… Show more

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Cited by 37 publications
(26 citation statements)
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“…The inset shows the lasing mode linewidth (full width at half maximum) as a function of the pump power that was extracted from emission spectra in (d) at 300 K. We observe a clear linewidth reduction by a factor of around two at threshold. for 17.2 at% Sn layer [17] and at temperatures below 250 K for 16.9 at%Sn [16] than those measured for both structures here. Also intriguing is the difference in the laser emission, that is single-mode in ref.…”
Section: Materials Characterizationsupporting
confidence: 42%
See 1 more Smart Citation
“…The inset shows the lasing mode linewidth (full width at half maximum) as a function of the pump power that was extracted from emission spectra in (d) at 300 K. We observe a clear linewidth reduction by a factor of around two at threshold. for 17.2 at% Sn layer [17] and at temperatures below 250 K for 16.9 at%Sn [16] than those measured for both structures here. Also intriguing is the difference in the laser emission, that is single-mode in ref.…”
Section: Materials Characterizationsupporting
confidence: 42%
“…[15] like the removal of interface defects. [16,17] As discussed in the introduction the tensile strain promotes the CB directness and shifts the laser transition from Γ-HH to Γ-LH. As discussed above this is expected to reduce the carrier density at threshold.…”
Section: Materials Characterizationmentioning
confidence: 99%
“…37b). 137 Anas ElBaz et al deposited the GeSn layer with 5.4% Sn content. They employed E-lithography to fabricate 9 mm of a microdisk, then surrounded it by a 350 nm SiN x stressor layer to relax the GeSn layer and reduce dislocations.…”
Section: Gesn-based Led Devicesmentioning
confidence: 99%
“…5 Examples of optoelectronic devices have already been made with Ge 1−x Sn x films, such as lasers and LEDs, 6 where room temperature lasing has been achieved recently in Ge 1−x Sn x microdisks with 17% Sn. 7 The magnitude and type of the bandgap of Ge 1−x Sn x cannot only be controlled by the Sn concentration since these properties also depend on the particle size when in the form of nanoparticles. A decreasing particle size will increase the bandgap energy due to the quantum confinement effect.…”
Section: Introductionmentioning
confidence: 99%
“…5 Examples of optoelectronic devices have already been made with Ge 1− x Sn x films, such as lasers and LEDs, 6 where room temperature lasing has been achieved recently in Ge 1− x Sn x microdisks with 17% Sn. 7…”
Section: Introductionmentioning
confidence: 99%