1978
DOI: 10.1063/1.90186
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Room-temperature operation of lattice-matched InP/Ga0.47In0.53As/InP double-heterostructure lasers grown by MBE

Abstract: Molecular beam epitaxial (MBE) growth of InP/Ga0.47In0.53As/InP double heterostructures has resulted in pulsed room-temperature lasing at 1.65 μm. Thresholds as low as 3.2 kA/cm2 for a 0.6-μm-thick layer has been achieved. These results were achieved by ’’premixing’’ the Ga and In together in a common source oven and precisely monitoring the Ga/In flux ratio during the growth of the Ga0.47In0.53As layer. Cd diffusion from a vapor source allowed us to p dope the top InP layer in the as-grown MBE wafer.

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Cited by 54 publications
(2 citation statements)
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“…In order to achieve resonance at λ (2) we have designed a cavity containing a InP/Ga 0.47 In 0.53 As/InP heterostructure with undoped layers (layers b/a/b of Fig. 1) [21] with a Polyethyl methacrylate (PMMA) substrate (layer c of Fig. 1) for the bilayer graphene and silver mirrors (layers d of Fig.…”
Section: The Scenario Dramatically Changes When Amentioning
confidence: 99%
“…In order to achieve resonance at λ (2) we have designed a cavity containing a InP/Ga 0.47 In 0.53 As/InP heterostructure with undoped layers (layers b/a/b of Fig. 1) [21] with a Polyethyl methacrylate (PMMA) substrate (layer c of Fig. 1) for the bilayer graphene and silver mirrors (layers d of Fig.…”
Section: The Scenario Dramatically Changes When Amentioning
confidence: 99%
“…The conventional method of InP substrate cleaning for molecular beam epitaxy (MBE) includes a flash annealing at around 500 1C in the growth chamber under phosphorous vapor pressure, which is carried out after degassing at much lower temperature without phosphorous pressure in the preparation chamber [1,2]. During this annealing, a large amount of oxygen-included impurity gases, such as CO, CO 2 , and H 2 O are emitted in the growth chamber, which deteriorate the quality of vacuum, and furthermore promote oxidization of the source materials such as Ga and Al in K-cells.…”
Section: Introductionmentioning
confidence: 99%