Romanian ECR ion source project RECRIS

Dobrescu, S.; Schächter, Levi; Badescu-Singureanu, Al. I.; Zoran, V.

doi:10.1063/1.1146787

Cited by 3 publications

(1 citation statement)

References 9 publications

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“…As metallic ion implanter, we used an electron cyclotron resonance (ECR) ion source 5 ; an improvement in the ECR source design permits the sputtering of a metallic cathode and the inclusion of metallic ions in the argon plasma.…”

Section: Introductionmentioning

confidence: 99%

Positron annihilation spectroscopy studies of implanted polymer membranes

Constantin

Petruneac

Focşǎneanu

2020

Polymers for Advanced Techs

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Two different polymer membranes, polyethylene and Nafion, have been sequentially implanted under vacuum at room temperature with 90 keV copper ions up to 1017 ions/cm2; after each implantation step, the targets were subjected to analysis with Positron annihilation lifetime spectroscopy and coincidence Doppler broadening spectroscopy. Both membranes revealed a similar behavior regarding the high fluence superficial implantation, but with different degree of magnitude. In order to endorse the Positrons annihilation spectroscopy results, scanning electron microscopy coupled with energy‐dispersive energy has been performed on the same targets, despite its lower sensitivity.

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Section: Introductionmentioning

confidence: 99%

Positron annihilation spectroscopy studies of implanted polymer membranes

Constantin

Petruneac

Focşǎneanu

2020

Polymers for Advanced Techs

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High secondary electron emission for an enhanced electron density in election cyclotron resonance plasma

Schächter

Dobrescu

Badescu-Singureanu

et al. 1998

Review of Scientific Instruments

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The possibility of increasing the electron cyclotron resonance (ECR) plasma electron density by secondary electron emission has already been pointed out and tested by different authors. In this work the effective secondary electron emission coefficient σeff under electron impact was measured and its evolution studied as a function of the primary electron beam energy and intensity of the target bias. The usual parameters of the ECR plasma such as the electron temperature, the plasma electric potential, and the ambipolar diffusion effects in the ECR plasma chamber have been considered during these measurements. With that end in view a research facility delivering electron beams with energies in the 0–15 keV range and intensities in the 1×10−11–2×10−5 A range was developed. The study of the effective secondary electron emission coefficient σeff was carried out on different targets made of graphite, of metals such as pure and technical Al, Ta, Ni, stainless steel, and of metal-dielectric structures Al–Al2O3. For some Al–Al2O3 structures high values of σeff strongly dependent upon the primary electron beam energy and intensity and upon the target negative bias have been obtained. Such a dependence was not observed for metals. The use of highly emissive metal-dielectric structures in the plasma chamber of an ECRIS should lead to a significant enhancement of the ECR plasma electron density and consequently of the production of highly charged ions.

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RECRIS-Romanian ECR ion source: Performances and experimental developments

Dobrescu

Schächter

2002

Review of Scientific Instruments

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The 14 GHz electron cyclotron resonance (ECR) ion source—RECRIS, developed at the National Institute for Physics and Nuclear Engineering (IFIN-HH) in Bucharest, Romania is presented. The source is conceived as a facility for atomic physics and material studies. The main constructive characteristics and performances of RECRIS are presented. The construction has some original characteristics: modular construction allowing simple dismounting and modification of the inner parts, high extraction voltage, up to 50 kV, and the possibility to use some techniques to enhance the performances, such as a biased disk, mixing gas, and others. The source is provided with a 90° analyzing magnet and with experimental devices and are presented as well. The main experimental device connected to the ECR ion source is a highly sensitive and wide mass range time-of-flight mass spectrometer for recoil ions.

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Romanian ECR ion source project RECRIS

Cited by 3 publications

References 9 publications

Positron annihilation spectroscopy studies of implanted polymer membranes

Positron annihilation spectroscopy studies of implanted polymer membranes

High secondary electron emission for an enhanced electron density in election cyclotron resonance plasma

RECRIS-Romanian ECR ion source: Performances and experimental developments

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