2022
DOI: 10.1016/j.apsusc.2021.152267
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Role of the metal supply pathway on silicon patterning by oblique ion beam sputtering

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Cited by 6 publications
(2 citation statements)
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“…Furthermore, for incidence angles larger than the threshold value, the induced patterns displayed short-range hexagonal order, instead of the expected ripple shape [149]. Also, due to the Fe implantation the silicide-rich regions were rather localized on the surface, and close to the edge of the induced nanostructures [148][149][150]. This can be appreciated in figure 18 where localized Fe-rich regions (green in figure 18(a) and dark grey in figure 18(b)) are observed at the edges of the protruding nanostructures.…”
Section: Reactive Ionsmentioning
confidence: 88%
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“…Furthermore, for incidence angles larger than the threshold value, the induced patterns displayed short-range hexagonal order, instead of the expected ripple shape [149]. Also, due to the Fe implantation the silicide-rich regions were rather localized on the surface, and close to the edge of the induced nanostructures [148][149][150]. This can be appreciated in figure 18 where localized Fe-rich regions (green in figure 18(a) and dark grey in figure 18(b)) are observed at the edges of the protruding nanostructures.…”
Section: Reactive Ionsmentioning
confidence: 88%
“…Furthermore, for incidence angles larger than the threshold value, the induced patterns displayed short-range hexagonal order, instead of the expected ripple shape [149]. Also, due to the Fe implantation the silicide-rich regions were rather localized on the surface, and close to the edge of the induced nanostructures [148][149][150].…”
Section: Reactive Ionsmentioning
confidence: 92%