1977
DOI: 10.1103/physrevb.15.4699
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Role of plasmon decay in secondary electron emission in the nearly-free-electron metals. Application to aluminum

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Cited by 128 publications
(65 citation statements)
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“…It is instructive to compare this result with that of a frequently applied argument in elementary theories of secondary electron emission (BRUINING, 1954;CHUNG et al, 1974CHUNG et al, , 1977. In the present notation, the production rate of liberated electrons per energy, depth and bombarding ion is laV(E,X)/aEI.…”
Section: Qualitative Considerationsmentioning
confidence: 83%
“…It is instructive to compare this result with that of a frequently applied argument in elementary theories of secondary electron emission (BRUINING, 1954;CHUNG et al, 1974CHUNG et al, , 1977. In the present notation, the production rate of liberated electrons per energy, depth and bombarding ion is laV(E,X)/aEI.…”
Section: Qualitative Considerationsmentioning
confidence: 83%
“…On the one hand, more primary electrons are backscattered compared to the case without surface excitations (see Figure 2), so that an increase in the simulated deposition rate might be expected (at least for primary energies in the 1-2 keV regime and below). On the other hand, more slow (≤50 eV) secondary electrons will be available from the decay of surface plasmons [56] excited by either the incoming electrons or the outgoing electrons (backscattered electrons or emitted secondary electrons). This should also contribute to an increase of the simulated deposition rate and additionally lead to an enhancement of the FEBID proximity effect.…”
Section: Resultsmentioning
confidence: 99%
“…This assumption follows Chung's work (Chung & Everhart, 1977) on plasmon damping. Under this procedure, with the differential energy loss cross section or the secondary electron excitation function determined using SPA, all SEs were assumed to be excited in the same way as through plasmon damping.…”
Section: Electron Cascadingmentioning
confidence: 95%