2013
DOI: 10.1016/j.ssc.2013.06.020
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Role of oxygen in multiferroic behavior of BiFeO3 films grown on 0.2% Nb doped SrTiO3

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Cited by 31 publications
(14 citation statements)
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“…It is reported that oxygen vacancies play an important role in leakage current or lossy ferroelectric loop in BFO films. [11] Oxygen vacancies release one or two electrons under applied electric field, leading to the leakage current. [32] Value of maximum polarisation decreases from »5.78 mC/cm 2 (pristine) to 2.68 mC/cm 2 (511) and 1.93 mC/cm 2 (512) due to irradiation which can be understood as follows: upon SHI irradiation, oxygen vacancies and chemical non-stoichiometry are introduced which in turn generate the conducting paths for charge carriers leading to leakage current across the film/substrate interface.…”
Section: Resultsmentioning
confidence: 99%
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“…It is reported that oxygen vacancies play an important role in leakage current or lossy ferroelectric loop in BFO films. [11] Oxygen vacancies release one or two electrons under applied electric field, leading to the leakage current. [32] Value of maximum polarisation decreases from »5.78 mC/cm 2 (pristine) to 2.68 mC/cm 2 (511) and 1.93 mC/cm 2 (512) due to irradiation which can be understood as follows: upon SHI irradiation, oxygen vacancies and chemical non-stoichiometry are introduced which in turn generate the conducting paths for charge carriers leading to leakage current across the film/substrate interface.…”
Section: Resultsmentioning
confidence: 99%
“…Substrate temperature (»670 C) and oxygen partial pressure (»100 mTorr) were maintained during deposition for achieving better multiferroic properties in BFO. [11] All the BFO/SNTO films (3 £ 10 mm 2 in size) were irradiated with 200 MeV Ag C15 ions having fluence » 5 £ 10 11 and 5 £ 10 12 ions/cm 2 , using 15 UD Tandem accelerator facility at Inter University Accelerator Centre (IUAC), New Delhi. Magnetic scanner was used to focus ion beam onto a spot of »1 mm diameter and was continuously scanned over a complete area of the film for uniform irradiation.…”
Section: Methodsmentioning
confidence: 99%
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“…These magnetoelectric (ME) compounds have faster switching speed, less response time and low power consumption in comparison to the conventional semiconducting/magnetic devices. 2,3 Due to this, these materials have potential for technological applications like multiple state memories, new data storage media, spintronics, biferroic memory elements, electric field controlled ferromagnetic resonance devices, transducer with magnetically modulated piezoelectricity and so on. [4][5][6][7] Various researchers have reported work on multiferroics which is based on structural, dielectric, magnetic and leakage current properties.…”
Section: Introductionmentioning
confidence: 99%