Role of magnetic field and bias configuration on HiPIMS deposition of W films

Vavassori, D.; Mirani, Francesco; Gatti, F.; Dellasega, David; Passoni, M.

doi:10.1016/j.surfcoat.2023.129343

Cited by 7 publications

(5 citation statements)

References 84 publications

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“…In TD0 3% samples, the abbreviated turn-on bias resulted in the lowest rate of deposition, which in turn hindered columnar crystal growth. In TD0 12% samples, the longer bias turn-on time resulted in fine columnar crystals (30~40 nm) due to the thinning effect of the inert gas ions during film growth [32]. Similar results were obtained under TD50 conditions.…”

Section: Resultssupporting

confidence: 74%

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Effects of Synchronous Bias Mode and Duty Cycle on Microstructure and Mechanical Properties of AlTiN Coatings Deposited via HiPIMS

Tang,

Huang,

Chen

et al. 2023

Coatings

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The good mechanical properties of metal nitrides make them ideal surface coatings for cutting tools and mold components. Conventional TiN coatings have largely been replaced by AlTiN due to their superior mechanical properties and resistance to high temperatures. In this study, we investigated the application of bias voltage to the substrate to enhance ion bombardment during the synthesis of protective AlTiN coatings using high-power impulse magnetron sputtering (HiPIMS) with synchronous trigger-direct current (ST-DC) bias voltage. The ST-DC parameters included the duty cycle duration (3%, 6%, 12%, 18%) and turn-on time, which included synchronous (TD0) or a trigger delay of 50 μs (TD50). Scanning electron microscope images revealed that the highest deposition rate (22.1 nm/min) was achieved using TD50 with a duty cycle of 3%. The results obtained using an electron probe microanalyzer and X-ray diffractometer revealed the formation of an h-AlN structure when the Al/Ti ratio was between 0.71 and 0.74. Transmission electron microscopy and nanoindentation results revealed that transforming DC bias into synchronous bias to boost the bias output time (i.e., increasing the duty cycle) increased AlTiN grain refinement (from ~100 nm to ~55 nm) with a corresponding increase in hardness (from 22.7 GPa to 24.7 GPa) as well as an increase in residual stress within the AlTiN coating (from 0.16 GPa to −51 GPa). The excellent adhesion performance of the coatings provided further evidence indicating the importance of duty cycle and trigger delay when using pulsed-DC bias in HiPIMS.

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Section: Resultssupporting

confidence: 74%

“…Researchers have had considerable success in implementing HiPIMS in conjunction with synchronous bias using a single metal target for the deposition of binary compound coatings [31,32]. Note that the composition ratio of dissociated metal and gas ions in the metal target differed from that in the alloy target.…”

Section: Introductionmentioning

confidence: 99%

Effects of Synchronous Bias Mode and Duty Cycle on Microstructure and Mechanical Properties of AlTiN Coatings Deposited via HiPIMS

Tang,

Huang,

Chen

et al. 2023

Coatings

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“…As a result, hot electrons and protons with energies up to ~6 MeV were accelerated. We consider as a reference sample a bi-layer structure composed of a 2.2 μm thick chromium coating (deposited by a Direct Current Magnetron Sputtering present in Politecnico di Milano [18,19]) and a millimeter-thick copper substrate. The irradiation of this sample was carried out by exploiting two irradiation setups.…”

Section: Combined Laser-driven Edx and Pixe Experimentsmentioning

confidence: 99%

Laser-driven particle acceleration for multipurpose elemental analysis of materials

Mirani

Maffini

Galbiati

et al. 2023

Applying Laser-Driven Particle Acceleration III: Using Distinctive Energetic Particle and Photon Sources

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Non-destructive material characterization exploiting radiation sources is of crucial importance in several fields ranging from the characterization of artworks to environmental monitoring. For instance, Ion Beam Analysis techniques exploiting particle accelerators stand for their unparalleled detection capabilities. However, the wide use of these techniques is limited by the large costs and dimensions of the exploited sources. In this framework, laser-driven particle acceleration represents a promising alternative to conventional sources since it can address some of their limitations. It relies on the interaction of a super-intense ultrashort laser pulse with a target material to accelerate high-energy electrons and ion bunches. Laser-driven radiation sources are potentially more compact and cheaper than particle accelerators. Moreover, the same laser source can provide different radiations by acting on the target configuration. Besides electrons and ions, high-energy photons and neutrons can be produced by exploiting suitable converter materials. Lastly, the particle energies can be controlled by tuning both the laser intensity and target properties. Here, we show some of the most recent results related to the application of laser-driven radiation sources to materials characterization. Our strategy is based on advanced near-critical Double-Layer Targets (DLT) to enhance the acceleration process. By means of experimental and numerical tools, we show how laser-driven protons, electrons, photons, and neutrons can be exploited for surface and bulk elemental analysis, as well as radiography. Notably, DLTs allow for satisfying the requirements of the techniques, in terms of energies and fluxes, with reduced laser requirements.

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“…o enhance the sputtering rate of diode sputtering and decrease the glow discharge conditions and high temperature of the substrate, magnetron sputtering equipment was developed by introducing a magnetic field to the diode sputtering process [1][2][3][4][5]. This technology offers the benefits of high deposition rate and low temperature sputtering, and is now widely utilized in various coating industries.…”

Section: Introductionmentioning

confidence: 99%

Design and Analysis of a New Excitation Structure for Magnetron Sputtering

Su,

An,

et al. 2024

IEEE Access

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Magnetron sputtering systems are widely used for depositing industrially important coatings. Research has been conducted to optimize and improve these structures to increase coating effectiveness and target utilization. The paper investigates the engineering problem of uneven target etching caused by an uneven magnetic field in magnetron sputtering equipment. The characteristics of the desired magnetic field distribution required by magnetron sputtering equipment are analyzed, and a corresponding excitation structure and analytical model for cylindrical magnetron sputtering equipment are proposed and calculated. The uniform magnetic field design is realized by analytical modeling of the excitation structure. The axial magnetic field distributions produced by an axisymmetric solenoid system and several similar excitation structures are analyzed and compared. The analytical results were verified through finite element simulations and experiments, demonstrating the accuracy and effectiveness of the method. The excitation structure, which is designed with a uniform magnetic field, can produce an axial component of magnetic flux density with a uniformity deviation of less than 4.3% across 73% of the target surface. The analytical model describes the distribution of the axial component of the magnetic flux density and optimizes the magnetic field. The model enables the simulation of plasma distribution and film growth, aiming to enhance the target utilization rate and substrate deposition rate. The conclusions serve as a reference for designing high-performance magnetron sputtering equipment.INDEX TERMS Axisymmetric solenoidal excitation structure, cylindrical magnetron sputtering, high uniformity magnetic field distribution, uniform magnetic field design.T

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Role of magnetic field and bias configuration on HiPIMS deposition of W films

Cited by 7 publications

References 84 publications

Effects of Synchronous Bias Mode and Duty Cycle on Microstructure and Mechanical Properties of AlTiN Coatings Deposited via HiPIMS

Effects of Synchronous Bias Mode and Duty Cycle on Microstructure and Mechanical Properties of AlTiN Coatings Deposited via HiPIMS

Laser-driven particle acceleration for multipurpose elemental analysis of materials

Design and Analysis of a New Excitation Structure for Magnetron Sputtering

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