2017
DOI: 10.1021/acs.chemmater.7b03618
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Role of Combustion Chemistry in Low-Temperature Deposition of Metal Oxide Thin Films from Solution

Abstract: Metal-oxide thin films find many uses in (opto)­electronic and renewable energy technologies. Their deposition by solution methods aims to reduce manufacturing costs relative to vacuum deposition while achieving comparable electronic properties. Solution deposition on temperature-sensitive substrates (e.g., plastics), however, remains difficult due to the need to produce dense films with minimal thermal input. Here, we investigate combustion thin-film deposition, which has been proposed to produce high-quality… Show more

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Cited by 31 publications
(18 citation statements)
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“…The answer to this question would enable the researcher to determine, for example, what types of substrates could be layered with a metal coating of certain conductivity. We therefore leveraged Ada to effectively study the numerous compositional 47 , 48 and processing variables 43 , 49 that influence processing temperatures and the corresponding conductivities.
Fig.
…”
Section: Resultsmentioning
confidence: 99%
“…The answer to this question would enable the researcher to determine, for example, what types of substrates could be layered with a metal coating of certain conductivity. We therefore leveraged Ada to effectively study the numerous compositional 47 , 48 and processing variables 43 , 49 that influence processing temperatures and the corresponding conductivities.
Fig.
…”
Section: Resultsmentioning
confidence: 99%
“…Figure 1a shows the thermal analysis of the combustible precursors using thermogravimetric analysis (TGA) and differential thermal analysis (DTA), along with the first derivative of TGA, which indicates that the combustible precursor undergoes an exothermic reaction. Although the use of bulk precursor thermal analysis for predicting the thermal decomposition of precursor thin films is debatable, [24,34] it provides an initial rough estimation of the minimum temperature and/or annealing temperature (T a ) at which the product-metal oxide forms. Owing to the large surface-to-volume ratio of the deposited thin films with thickness in the range of nanometers, the required T a is comparatively lower than the magnitude predicted from the bulk precursor thermal analysis.…”
Section: Resultsmentioning
confidence: 99%
“…This is expected to have a two-fold influence on the microstructural evolution in the multilayered thin films, as schematically shown in Fig 6b. Firstly, it enables a more efficient removal of the gaseous products from the inner part of the films in the case of thinner layers, resulting in lower porosity (see Fig.3b). Secondly, a faster removal of the gas will result in increased kinetics of the combustion reaction 50 and an increased amount of released heat in a shorter amount of time, which results in larger grain size and improved crystallinity of the final films (see Fig. 2b).…”
Section: Resultsmentioning
confidence: 99%