2019
DOI: 10.1016/j.apsusc.2018.12.119
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Robustness of topological states in Bi2Se3 thin film grown by Pulsed Laser Deposition on (0 0 1)-oriented SrTiO3 perovskite

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Cited by 17 publications
(6 citation statements)
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“…1), performed by means of the IMD package in the XOP software [18,19], fully match the design value of 30 nm. XRR oscillations are recorded up to 2θ values of 4 • , while, above this angle, the oscillations fall below the experimental sensitivity of the x-ray diffractometer [17,20,21]. In situ scanningtunneling-microscopy (STM) experiments are performed with an atomic-resolution UHV apparatus, immediately after the growth of the samples.…”
Section: A Growth and Structural Characterizationmentioning
confidence: 99%
“…1), performed by means of the IMD package in the XOP software [18,19], fully match the design value of 30 nm. XRR oscillations are recorded up to 2θ values of 4 • , while, above this angle, the oscillations fall below the experimental sensitivity of the x-ray diffractometer [17,20,21]. In situ scanningtunneling-microscopy (STM) experiments are performed with an atomic-resolution UHV apparatus, immediately after the growth of the samples.…”
Section: A Growth and Structural Characterizationmentioning
confidence: 99%
“…On the other hand, unlike crystal exfoliation, the growth of films provides a high control on thickness down to few nanometers, which represents an opportunity for the observation and tuning of interesting effects. Several growth techniques such as molecular beam epitaxy (MBE) [ 30 , 31 , 32 ] or pulsed laser deposition (PLD) [ 33 , 34 ] have proven to be good tools for the study of TI thin films, allowing for the use of different substrates and also the growth of heterostructures. However, the number of defects in the films is still high, and the surface–carrier mobilities are still low, placing TIs far from the technological scenario.…”
Section: Introductionmentioning
confidence: 99%
“…[33][34][35] To obtain a greater transport contribution from the topological SS, it is important to obtain TI thin lms with a high crystallization quality. The methods usually used for preparing TI thin lms include molecular beam epitaxy (MBE), 33,[36][37][38][39][40] chemical vapor deposition, [41][42][43][44] physical vapor deposition, [45][46][47][48] pulsed laser deposition (PLD) [49][50][51][52][53][54][55][56][57][58][59][60] and sputtering. 61,62 The MBE is the method mainly used to obtain at and thin TI lms for fundamental research, because of its advantages of 2D growth, single crystal yield and easily controlled doping.…”
Section: Introductionmentioning
confidence: 99%
“…In a recently published paper on depositing TI lms using PLD, the root square mean deviation of roughness (R q ) was decreased to 0.5-0.7 nm, but there existed more than four steps of QL at the surface. 60 It is necessary to use at thin TI lm with a large area as the bottom or middle layer of the heterostructure in devices for spintronics. [64][65][66][67] Investigating better preparation conditions using PLD for TI thin lms with at surfaces is a signicant area of research.…”
Section: Introductionmentioning
confidence: 99%