Robustly nano-tailored honeycomb structure for high-throughput antireflection polymer films

Antireflective Transparent Conductive Oxide Film Based on a Tapered Porous Nanostructure

“…It has been reported that the reflection from the air-substrate can be successfully removed by forming either tapered nipples or tapered pores (negative ARS, N-ARS) on the substrate [18,19]. Monolithic tapered structures of subwavelength size induce a continuous material fraction change from air to the substrate, resulting in very low surface reflection.…”

“…Monolithic tapered structures of subwavelength size induce a continuous material fraction change from air to the substrate, resulting in very low surface reflection. In the case of a monolithic N-ARS film, its high mechanical stability enables it to be mass-produced through a roll-to-roll process [19]. By coating the ITO layer evenly on the surface of N-ARS film, it is possible to simply fabricate CCRI ITO film for the industrial production.…”

“…In order to produce the CCRI ITO film, a GaAs template with paraboloidal nipples of subwavelength size in a hexagonal array was initially prepared, as shown in Figure 2b [20]. Using a thermal nanoimprint process, tapered pores of approximately 200 nm depth with a 290 nm lattice period were fabricated on the PMMA film surface [19]. Afterward, ITO was coated on the surface of an N-ARS film via sputtering.…”

Manufacturing of highly ordered porous anodic alumina with conical pore shape and tunable interpore distance in the range of 550 nm to 650 nm

“…The PAA with tapered pore structure and interpore distance D c in the range of 100 nm to 490 nm were previously fabricated [21][22][23][24]. The alumina taper-nanopores were used for preparing polymer AR coatings operating in visible and NIR range via template imprinting technique [18,25,26]. For an AR coating working at longer wavelengths, however, a larger pore spacing is needed [3,4,17].…”

Morphological and chemical characterization of highly ordered conical-pore anodic alumina prepared by multistep citric acid anodizing and chemical etching process

“…The graded-index nanostructures are insensitive to polarization effects, guaranteeing broad-band and omni-directional anti-reflectivity properties required for a perfect anti-reflective (AR) performance [28][29][30]. The AAO templates with D c between 100 and 200 nm were successfully used for preparing polymer AR coatings operating in visible and NIR range [31,32]. It is, however, expected that upon the increase of AAO geometrical parameters, including D c and AAO thickness, the AR properties can be expanded beyond the NIR spectral range [33,34].…”