2020
DOI: 10.1126/sciadv.aaz0632
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Robust, high-performance n-type organic semiconductors

Abstract: Organic semiconductors (OSCs) are important active materials for the fabrication of next-generation organic-based electronics. However, the development of n-type OSCs lags behind that of p-type OSCs in terms of charge-carrier mobility and environmental stability. This is due to the absence of molecular designs that satisfy the requirements. The present study describes the design and synthesis of n-type OSCs based on challenging molecular features involving a π-electron core containing electronegative N atoms a… Show more

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Cited by 153 publications
(191 citation statements)
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“…To verify this, a bottom‐gate top‐contact OTFT was fabricated using N , N′ ‐diphenethyl‐3,4,9,10‐benzo[ de ]isoquinolino[1,8‐ gh ]quinolinetetracarboxylic diimide (PhC 2 –BQQDI), a state‐of‐the‐art n‐type material which our group has recently developed. [ 49 ] PhC 2 –BQQDI is a solution‐processable, air‐stable semiconductor, which is thought to be able to withstand the entire process of the present transfer technique. The fabrication procedures were almost same as those for the p‐type OTFTs described above, although the preparation of the semiconductor and insulator layer was adjusted specifically to PhC 2 –BQQDI (see Experimental section).…”
Section: Resultsmentioning
confidence: 99%
“…To verify this, a bottom‐gate top‐contact OTFT was fabricated using N , N′ ‐diphenethyl‐3,4,9,10‐benzo[ de ]isoquinolino[1,8‐ gh ]quinolinetetracarboxylic diimide (PhC 2 –BQQDI), a state‐of‐the‐art n‐type material which our group has recently developed. [ 49 ] PhC 2 –BQQDI is a solution‐processable, air‐stable semiconductor, which is thought to be able to withstand the entire process of the present transfer technique. The fabrication procedures were almost same as those for the p‐type OTFTs described above, although the preparation of the semiconductor and insulator layer was adjusted specifically to PhC 2 –BQQDI (see Experimental section).…”
Section: Resultsmentioning
confidence: 99%
“…The device for gated Hall effect measurements was prepared according to the literature procedure. [ 31 ] A highly n ++ ‐doped Si wafer, serving as the gate electrode, with a thermally oxidized SiO 2 layer (200 nm) was encapsulated by an ≈30‐nm‐thick AL‐X601 layer for adjusting surface wettability and reducing trap sites. The SC PhC 2 −BQQDI thin film was deposited by edge‐casting [ 32 ] from a 0.03 wt% 1‐methylnaphthalene solution.…”
Section: Methodsmentioning
confidence: 99%
“…As estimated in our previous work, the direction of the transport measurement is along b *. [ 31 ] Therefore, the present transport properties are linked to band dispersion, which corresponds to the S − X line shown in Figure 2c. The effective mass ( m *) was estimated to be 2.09 m e , where m e is the rest mass of an electron.…”
Section: Figurementioning
confidence: 95%
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