2020
DOI: 10.1002/adfm.202003977
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Electroless‐Plated Gold Contacts for High‐Performance, Low Contact Resistance Organic Thin Film Transistors

Abstract: Deposition of metallic electrodes on a semiconductor medium is an indispensable factor in governing carrier injection, and a metal/semiconductor contact that can be formed via solution process is highly desired in printed electronics. However, fine-patterning the solution processes of metallic electrodes without damaging the excellent electronic properties of organic semiconductors (OSCs) is still a challenge. In this work, electroless plating, a metal coating technique that involves auto-catalytic reaction in… Show more

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Cited by 15 publications
(9 citation statements)
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“…Regarding the single crystal active layer, R SH is related to the intrinsic mobility and the gate‐channel capacitance per unit area ( C i ) via Equation ().RSH=1μ0Cnormalifalse| false(VnormalGVTHfalse) false|Equation () is the main equation used for evaluation of contact resistance by TLM. [ 2,3,13,20–23,34 ]…”
Section: Resultsmentioning
confidence: 99%
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“…Regarding the single crystal active layer, R SH is related to the intrinsic mobility and the gate‐channel capacitance per unit area ( C i ) via Equation ().RSH=1μ0Cnormalifalse| false(VnormalGVTHfalse) false|Equation () is the main equation used for evaluation of contact resistance by TLM. [ 2,3,13,20–23,34 ]…”
Section: Resultsmentioning
confidence: 99%
“…Equation ( 4) is the main equation used for evaluation of contact resistance by TLM. [2,3,13,[20][21][22][23]34] By transferring Au electrodes onto the single crystalline C 10 -DNTT layer, five OFETs with the channel lengths of 11, 22, 30, 36, and 40 μm are constructed (inset in Figure 3a). The transfer curves of all these OFETs with different channels are measured at a small V DS ¼ À1 mV (Figure 3a), and the contact resistance is extracted from the intercept of R T W (L) plot (Figure 3b).…”
Section: Extraction Of Access Resistance In Monolayer Ofetsmentioning
confidence: 99%
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“…Herein, we selected N,N'-diphenethyl-3,4,9,10benzo[de]isoquinolino [1,8-gh]quinolinetetracarboxylic diimide (PhC 2 -BQQDI), which is a bench-marked n-type material recently developed by our group (Figure 3a). [10] PhC 2 -BQQDI exhibits high electron mobility of above 1 cm 2 V −1 s −1 , [10,26,29,30] and sufficient compatibility with solution processing and is sufficiently air-stable to withstand the water-based transfer process. But, relatively high substrate temperature (≈150 °C) is required to obtain high-quality single-crystal films.…”
Section: Fabrication Of N-type Osc Thin Filmsmentioning
confidence: 99%
“…In a recent study, we developed an ideal transfer method for large‐area OSC single‐crystal thin films, [ 24 ] as well as for patterned electrodes. [ 25,26 ] The developed method revolutionized the conventional bottom‐up approach for fabricating OTFT devices. Particularly, the reported transfer technique enables the application of the high‐performance, solution‐processed OSC thin films on various underlayers/substrate and overcomes the issues generally associated with solution processing.…”
Section: Introductionmentioning
confidence: 99%