RIB waveguides were fabricated with the use of selective, wet chemical etching of two-component waveguide films SiO 2 :TiO 2 which were obtained using sol-gel method. Photoresist was applied as a mask in the process. The etching of the films SiO 2 :TiO 2 was carried out in water solutions of ammonia fluoride. The paper presents the determined technological characteristics, power distributions in the obtained strip waveguides and the results of theoretical analysis.