2005
DOI: 10.1016/j.optcom.2004.10.074
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Rib waveguides fabricated by means of chemical etching of sol–gel SiO2:TiO2 films

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Cited by 21 publications
(13 citation statements)
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“…Technological characteristics for other solutions and SiO 2 :TiO 2 films annealed in lower temperature were presented in Ref. [13].…”
Section: Rib Waveguidesmentioning
confidence: 99%
“…Technological characteristics for other solutions and SiO 2 :TiO 2 films annealed in lower temperature were presented in Ref. [13].…”
Section: Rib Waveguidesmentioning
confidence: 99%
“…In the fabrication process of strip waveguides the solution of ammonia fluoride was used with the addition of isopropanole for which etching rate was 0.052nm/s. Technological characteristics for other solutions and SiO 2 ;TiO 2 films annealed in lower temperature were presented in work [7].…”
Section: Chemical Etchingmentioning
confidence: 99%
“…One of the most commonly applied systems in the sol-gel technology is two-component system SiO2:TiO2. By an appropriate selection of components, we can produce films of the refractive index which is within the range from the refractive index of pure silica (1.4) to the refractive index of titania(2.3) [8]. The films of low refractive indexes afford the possibility to produce planar systems which are compatible with telecommunication optical waveguide fibers.…”
Section: Introductionmentioning
confidence: 99%