2009
DOI: 10.1109/tmag.2009.2030590
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Review of On-Chip Inductor Structures With Magnetic Films

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Cited by 301 publications
(133 citation statements)
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References 38 publications
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“…The total thickness of the NiFe/AlN multilayer composite is 2.08 µm and was chosen as a compromise between the total deposition time of the layered stack and significant RF performance enhancement. The thickness of 100 nm chosen for individual NiFe layers is a good compromise for achieving high total volume ratio of NiFe, by still limiting the induced RF currents within the individual layers [1]. Vertical interconnects were created by etching the magnetic/dielectric layers in a Veeco Nexus IBE dry ion beam etching tool.…”
Section: Concept Design and Fabricationmentioning
confidence: 99%
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“…The total thickness of the NiFe/AlN multilayer composite is 2.08 µm and was chosen as a compromise between the total deposition time of the layered stack and significant RF performance enhancement. The thickness of 100 nm chosen for individual NiFe layers is a good compromise for achieving high total volume ratio of NiFe, by still limiting the induced RF currents within the individual layers [1]. Vertical interconnects were created by etching the magnetic/dielectric layers in a Veeco Nexus IBE dry ion beam etching tool.…”
Section: Concept Design and Fabricationmentioning
confidence: 99%
“…O N-CHIP and interposer integrated inductors, used as passive components in RFICs or in system-in-package integrated components, are currently employed as air-core inductors with a maximum inductance density of 200 nH/mm 2 [1]. Their inductance per area would significantly be enhanced by magnetic core materials.…”
Section: Introductionmentioning
confidence: 99%
“…A possible solution would be excluding the inductors using a switched capacitor network [15], [16], however these are often not efficient outside their optimum voltage conversion ratio [17]. Achieving an efficient PwrSoC solution would require an inductor having a high quality factor [8], [18]. The PwrSiP products available have power densities of 0.2-0.5 W/mm 3 , and efficiencies around 90-95 % [8].…”
Section: Introductionmentioning
confidence: 99%
“…[1][2]. Their main technologically requested parameters are high magnetic permeability and low coercivity.…”
Section: Introductionmentioning
confidence: 99%