2020
DOI: 10.1103/physrevapplied.14.064041
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Reversible and Irreversible Voltage Manipulation of Interfacial Magnetic Anisotropy in Pt / Co /Oxide Multilayers

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Cited by 16 publications
(13 citation statements)
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“…As shown in our previous work, the magnetization can be switched to a fully saturated OOP configuration by applying a negative gate voltage that oxidizes the Co layer. [19] In this state, the MFM image (Figure 2a) shows, as expected, no magnetic contrast.…”
Section: Nonvolatile Manipulation Of the Pma In Pt/co/tbo X Stackssupporting
confidence: 65%
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“…As shown in our previous work, the magnetization can be switched to a fully saturated OOP configuration by applying a negative gate voltage that oxidizes the Co layer. [19] In this state, the MFM image (Figure 2a) shows, as expected, no magnetic contrast.…”
Section: Nonvolatile Manipulation Of the Pma In Pt/co/tbo X Stackssupporting
confidence: 65%
“…We may then define the magnetic state obtained after the application of the bias voltage as nonvolatile. As already illustrated by our previous work, [19] the progressive and non-volatile variation of the magnetic anisotropy leads us to exclude electronic charge accumulation/depletion effects and to suggest that the voltage-driven migration of oxygen ions is the most probable driving mechanism. Since a positive bias drives oxygen ions away from the Co layer, this leads to a decrease of its oxidation which causes a decrease of the PMA (see sketch in Figure 2d).…”
Section: Nonvolatile Manipulation Of the Pma In Pt/co/tbo X Stacksmentioning
confidence: 61%
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“…Pt(4)/Co(1.1 to 1.2)/TbOx(0.6) and Pt(4)/Co(0.6)/AlOx(1) magnetic stacks were deposited by magnetron sputtering on Si/SiO 2 wafers (see also [18]). After patterning the films into 1-µm, 2-µm and 5µm wide strips by electron beam lithography (EBL) and ion-beam etching, a 10 nm thick ZrO 2 dielectric layer was deposited by atomic layer deposition (ALD).…”
Section: Methodsmentioning
confidence: 99%