2012
DOI: 10.1109/jphotov.2012.2201916
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Reverse Saturation Current Density Imaging of Highly Doped Regions in Silicon Employing Photoluminescence Measurements

Abstract: We present a camera-based technique for the local determination of reverse saturation current densities J 0 of highly doped regions in silicon wafers utilizing photoconductancecalibrated photoluminescence (PL) imaging at different illumination intensities. We apply this approach to 12.5 × 12.5 cm 2 float zone silicon (Si) samples with textured surfaces and a homogeneous phosphorous diffusion with sheet resistances between 24 and 230 Ω/ . We find enhanced PL emission at metallized regions of a sample due to ref… Show more

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Cited by 8 publications
(11 citation statements)
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“…The front reflectivity R front of the sample at the excitation wavelength λ exc = 930 nm follows from reflectance measurements using an integrating sphere. Finally, the images of J 0,rear + J 0,front are determined from the local τ eval and Δn eval according to (1).…”
Section: Dynamic Infrared Lifetime Mappingmentioning
confidence: 99%
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“…The front reflectivity R front of the sample at the excitation wavelength λ exc = 930 nm follows from reflectance measurements using an integrating sphere. Finally, the images of J 0,rear + J 0,front are determined from the local τ eval and Δn eval according to (1).…”
Section: Dynamic Infrared Lifetime Mappingmentioning
confidence: 99%
“…To determine J 0 , we measure the lifetime of lowly doped Si samples under high injection conditions (Δn N A ) according to (1). Under such conditions τ eff depends strongly on the excess charge carrier concentration Δn [18].…”
Section: A Evaluation In High-level Injectionmentioning
confidence: 99%
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