2019
DOI: 10.1002/pip.3201
|View full text |Cite
|
Sign up to set email alerts
|

For none, one, or two polarities—How do POLO junctions fit best into industrial Si solar cells?

Abstract: We present a systematic study on the benefit of the implementation of poly-Si on oxide (POLO) or related junctions into p-type industrial Si solar cells as compared with the benchmark of Passivated Emitter and Rear Cell (PERC). We assess three aspects: (a) the simulated efficiency potential of representative structures with POLO junctions for none (=PERC+), one, and for two polarities; (b) possible lean process flows for their fabrication; and (c) experimental results on major building blocks. Synergistic effi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

2
35
1

Year Published

2021
2021
2024
2024

Publication Types

Select...
6

Relationship

3
3

Authors

Journals

citations
Cited by 30 publications
(41 citation statements)
references
References 39 publications
(61 reference statements)
2
35
1
Order By: Relevance
“…Technological challenges are, besides aspects like homogeneity of Si layer thickness and (if present) in-situ dopant distribution, the absence of blistering and in particular the mitigation of wrap-around—also for nominal single-side deposition techniques like PE-CVD and AP-CVD. Alternatively, the process sequence can be designed in a way that it tolerates or even utilizes double-sided Si deposition 11 . For the post deposition high-temperature treatment, quartz tube furnace anneals (either in inert or oxidizing ambient or within a 44 or diffusion 45 ) are currently standard.…”
Section: Resultsmentioning
confidence: 99%
See 4 more Smart Citations
“…Technological challenges are, besides aspects like homogeneity of Si layer thickness and (if present) in-situ dopant distribution, the absence of blistering and in particular the mitigation of wrap-around—also for nominal single-side deposition techniques like PE-CVD and AP-CVD. Alternatively, the process sequence can be designed in a way that it tolerates or even utilizes double-sided Si deposition 11 . For the post deposition high-temperature treatment, quartz tube furnace anneals (either in inert or oxidizing ambient or within a 44 or diffusion 45 ) are currently standard.…”
Section: Resultsmentioning
confidence: 99%
“…Laser processing, e.g. laser oxidation 11 , might avoid the latter aspect and even the necessity to deposit or to print an etch barrier. The most attractive option would be to deposit the poly-Si already structured, e.g.…”
Section: Resultsmentioning
confidence: 99%
See 3 more Smart Citations