2022
DOI: 10.1016/j.nanoen.2022.107736
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Revealing multi-stage growth mechanism of Kirkendall voids at electrode interfaces of Bi2Te3-based thermoelectric devices with in-situ TEM technique

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Cited by 14 publications
(10 citation statements)
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“…According to the theory of growth kinetics of the interfacial reaction layer, the growth of the interfacial reaction layer is controlled by the reaction when the aging time is short, and the thickness of the interfacial reaction layer has a linear relationship with the aging time. ,, At 0 to 500 h, the previous results show that the contribution of interface contact resistivity is caused by the formation of the NiTe phase . Therefore, we assume that during the aging time of 500 h (about 20.83 days) at 150 °C, the R CN and R CP change linearly with the aging time H , combined with the actual change data of Ni/p-Bi 2 Te 3 and Ni/n-Bi 2 Te 3 interface measured in Figure a and b, respectively; the following relationship can be obtained: R CN = 0.0029 H + 5.304 R CP = 0.0013 H + 0.22 When H = 0 h, that is, in the initial state, the internal resistance of the device should be (1.7985 + R solder ); when H = 100 h, the internal resistance of the device should be (1.8148 + R solder ); and when H = 500 h, the device internal resistance should be (1.8801 + R solder ).…”
Section: Resultsmentioning
confidence: 99%
“…According to the theory of growth kinetics of the interfacial reaction layer, the growth of the interfacial reaction layer is controlled by the reaction when the aging time is short, and the thickness of the interfacial reaction layer has a linear relationship with the aging time. ,, At 0 to 500 h, the previous results show that the contribution of interface contact resistivity is caused by the formation of the NiTe phase . Therefore, we assume that during the aging time of 500 h (about 20.83 days) at 150 °C, the R CN and R CP change linearly with the aging time H , combined with the actual change data of Ni/p-Bi 2 Te 3 and Ni/n-Bi 2 Te 3 interface measured in Figure a and b, respectively; the following relationship can be obtained: R CN = 0.0029 H + 5.304 R CP = 0.0013 H + 0.22 When H = 0 h, that is, in the initial state, the internal resistance of the device should be (1.7985 + R solder ); when H = 100 h, the internal resistance of the device should be (1.8148 + R solder ); and when H = 500 h, the device internal resistance should be (1.8801 + R solder ).…”
Section: Resultsmentioning
confidence: 99%
“…After in situ heating, the interface microstructure was stable and no second phases were formed, suggesting that no reaction occurred (Figure 2b). Furthermore, no Kirkendall voids [ 49 ] or cracks were observed, indicating that the interdiffusion was suppressed. Notably, the gray difference could be attributed to the mass–thickness contrast, while the relatively weak diffraction contrast changes during the heating process were ascribed to the changes in thermal stress (Figure S5, Supporting Information and Movie S1).…”
Section: Resultsmentioning
confidence: 99%
“…After in situ heating, the interface microstructure was stable and no second phases were formed, suggesting that no reaction occurred (Figure 2b). Furthermore, no Kirkendall voids [49] or cracks were observed, indicating that the interdiffusion was [10,31,33,35,36,38,40,45] d) and e) plots of ρ c and σ s versus the root mean square of the aging time at 400°C, showing linear relationships.…”
Section: Increase In the Stability Of Teim/tecm Interfaces Using Fecr...mentioning
confidence: 97%
“…To guarantee that the relationship between structure and function is understood at the atomic scale with high temporal resolution, quantitative measurements of the composition of material structure and their bonding evolution in technologically relevant environments, including liquids, gases, and plasmas, are necessary for in situ and operando transmission electron microscopy to advance in the future. Even so, the TEM holder design’s use in batteries for in situ characterization is currently constrained, and there are challenges with data analysis, electrochemical scanning linkage, noise and drift correction, and imaging.…”
Section: Discussionmentioning
confidence: 99%