Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective

Ishikawa, Kenji; Ishijima, Tatsuo; Shirafuji, Tatsuru; Armini, Silvia; Despiau-Pujo, E.; Gottscho, Richard A.; Kanarik, Keren J.; Leusink, Gert J.; Marchack, Nathan; Murayama, Takahide; Morikawa, Yasuhiro; Oehrlein, Gottlieb S.; Park, Sangwuk; Hayashi, Hisataka; Kinoshita, Keizo

doi:10.7567/1347-4065/ab163e

Cited by 12 publications

(4 citation statements)

References 84 publications

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“…For this reason, plasma etching is preceded by a photolithography step, where a pattern is printed on a photoresist mask. The interdependence between the photolithography and plasma etching steps has become increasingly important in the race towards ever smaller dimensions of layered nanopatterns in microelectronics [224,225]. Incorrectly aligned layers may lead to erroneous interlayer connectivity, resulting in yield loss.…”

Section: Multiscale Measuring -Because Nature Is Still the Best Simul...mentioning

confidence: 99%

Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas

Vanraes

Venugopalan

Bogaerts

2021

Applied Physics Reviews

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The physics and chemistry of plasma-surface interaction is a broad domain relevant to various applications and several natural processes, including plasma etching for microelectronics fabrication, plasma deposition, surface functionalization, nanomaterial synthesis, fusion reactors, and some astrophysical and meteorological phenomena. Due to their complex nature, each of these processes are generally investigated in separate subdomains, which are considered to have their own theoretical, modeling and experimental challenges. In this review, however, we want to emphasize the overarching nature of plasma-surface interaction physics and chemistry, by focusing on the general strategy for its computational simulation. In the first half of the review, we provide a menu card with standard and less standardized computational methods to be used for the multiscale modeling of the underlying processes. In the second half, we illustrate the benefits and potential of the multiscale modeling strategy with a case study of Si and SiO2 etching by fluorocarbon plasmas, and identify the gaps in knowledge still present on this intensely investigated plasma-material combination, both on a qualitative and quantitative level. Remarkably, the dominant etching mechanisms remain the least understood. The resulting new insights are of general relevance, for all plasmas and materials, including their various applications. We therefore hope to motivate computational and experimental scientists and engineers to collaborate more intensely on filling the existing gaps in knowledge. In this way, we expect that research will overcome a bottleneck stage in the development and optimization of multiscale models, and thus the fundamental understanding of plasma-surface interaction. TABLE OF CONTENTS wanderlust 3.3.2 Application-specific methods -specialize in the impossible 3.3.3 Machine learning -brainstorming by artificial intelligence 3.3.4 Plasma sheath modeling -matter's aura explained 3.4 Multiscale measuring -because nature is still the best simulation tool 4. PLASMA ETCHING -FROM SCRATCHING THE SURFACE TO GOING IN DEPTH 4.1 The multiscale plasma etching model -one example to represent them all 4.1.1 The need for a bottom-up approach -message in a bottleneck 4.1.2 Hybrid Plasma Equipment Model -example of a hybrid macroscale method 4.1.3 Plasma sheath module -example of a semi-analytical sheath method 4.1.4 Surface kinetics module -example of a deterministic description 4.1.5 Monte Carlo Feature Profile Model -example of a kinetic Monte Carlo method 4.1.6 Experimental benchmarking of the working principle -examples of multiscale measuring 4.1.7 Reactor geometry and operating conditions -example of a case study 4.2 How to implement the surface processes -example of atomistic modeling and measuring data 4.2.1 Elementary plasma-surface mechanisms -simplicity is the ultimate sophistication 4.2.2 Design of the surface chemistry set -a mosaic of quantum data 4.3 Benchmarking the simulation model -bringing uncertainties to the surface 5.

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Section: Multiscale Measuring -Because Nature Is Still the Best Simul...mentioning

confidence: 99%

Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas

Vanraes

Venugopalan

Bogaerts

2021

Applied Physics Reviews

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“…These plasma interactions have a tremendous positive impact on society. For example, film deposition and material-etching processes have been developed for the atomic-scale manufacturing of semiconductor devices based on LTP technology [100][101][102][103][104]. In addition, methods for converting and synthesizing materials using the carbon or nitrogen cycle in the global circulation of materials have been discussed using plasma catalysis [105][106][107].…”

Section: Evolution and The Future Of Plasma-driven Sciencesmentioning

confidence: 99%

Plasma-Driven Sciences: Exploring Complex Interactions at Plasma Boundaries

Ishikawa,

Koga,

Ohno

2024

Plasma

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Plasma-driven science is defined as the artificial control of physical plasma-driven phenomena based on complex interactions between nonequilibrium open systems. Recently, peculiar phenomena related to physical plasma have been discovered in plasma boundary regions, either naturally or artificially. Because laboratory plasma can be produced under nominal conditions around atmospheric pressure and room temperature, phenomena related to the interaction of plasma with liquid solutions and living organisms at the plasma boundaries are emerging. Currently, the relationships between these complex interactions should be solved using science-based data-driven approaches; these approaches require a reliable and comprehensive database of dynamic changes in the chemical networks of elementary reactions. Consequently, the elucidation of the mechanisms governing plasma-driven phenomena and the discovery of the latent actions behind these plasma-driven phenomena will be realized through plasma-driven science.

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“…69,70) For the fabrication of wires and interconnects of the device, an insulating film is deposited, and then holes and trenches are manufactured by etching uncovered areas of the film with the protection of a patterned resist mask. 71) Reactive plasma is used for etching the insulating dielectric films, such as silicon dioxide, 72) silicon nitride, 73) silicon oxyfluoride, 74) and silicon oxycarbide. [75][76][77][78] Since the late 1990s, anisotropic etching has been used for the fabrication of deep holes and trenches with dimensions narrower than 100 nm and high-aspect ratios 48) In pulsed plasmas, negative ions can be extracted from the bulk plasma to boundary surface applying electrical reversal potential or positive bias.…”

Section: 5mentioning

confidence: 99%

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

Kambara

Kawaguchi

Lee

et al. 2022

Jpn. J. Appl. Phys.

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Low-temperature plasma processing technologies is essential for material synthesis, device fabrication, and surface treatment. The development of plasma-related products and services requires an understanding of the multiscale complex behaviors of plasma and the hierarchical integration of plasma generation, energy and mass transports through sheath region, surface reactions, and other processes. The importance of science-based and data-driven approaches to controlling systems is argued. The state-of-the-art of deep learning, machine learning, and artificial intelligence in low-temperature plasma science and technology is reviewed. In this review, the requirements and challenges for plasma parameter prediction and processing recipe discovery are asserted by researchers in the fields of material science and plasma processing. It also outlined a science-based, data-driven approach for development of virtual metrology in plasma processes.

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Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective

Cited by 12 publications

References 84 publications

Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas

Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas

Plasma-Driven Sciences: Exploring Complex Interactions at Plasma Boundaries

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

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