1973
DOI: 10.1080/00150197308235781
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Retention in thin ferroelectric films

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Cited by 32 publications
(8 citation statements)
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“…The development of ferroelectric thin films started at the late 1960s and early 1970s when progress in integrated Si devices and thin film processing techniques triggered interest in the use of ferroelectric thin films for fabrication of nonvolatile memories. [1][2][3] Difficulties with ferroelectric materials processing and integration frustrated the attempts to make practical memory devices until the 1980s. The advances in processing of complex ferroelectric oxides at the mid-1980s, 4,5 and perhaps also the discovery of the high temperature superconductive oxides and the subsequent efforts to integrate them onto silicon resulted in a revival of interest in ferroelectric memories, and in 1987, ferroelectric memory integrated with silicon complementary metal-oxide semiconductor ͑CMOS͒ was demonstrated.…”
Section: Introductionmentioning
confidence: 99%
“…The development of ferroelectric thin films started at the late 1960s and early 1970s when progress in integrated Si devices and thin film processing techniques triggered interest in the use of ferroelectric thin films for fabrication of nonvolatile memories. [1][2][3] Difficulties with ferroelectric materials processing and integration frustrated the attempts to make practical memory devices until the 1980s. The advances in processing of complex ferroelectric oxides at the mid-1980s, 4,5 and perhaps also the discovery of the high temperature superconductive oxides and the subsequent efforts to integrate them onto silicon resulted in a revival of interest in ferroelectric memories, and in 1987, ferroelectric memory integrated with silicon complementary metal-oxide semiconductor ͑CMOS͒ was demonstrated.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, internal fields become comparable with external field because of high polarization at this stage. Therefore, the polarization rate at merging stage is expressed as: dPd EL dEA aft (7) where 4 is also an interface related constant.…”
Section: Coementioning
confidence: 99%
“…The temperature at which there is transition of the gradient increases strongly with x . The positive gradients arise from thermally activated loss and the leakage build‐up of free electric charges . For x = 0, we find only a positive gradient component to the plot.…”
Section: Resultsmentioning
confidence: 71%
“…In terms of temporal retention, R ( t ) is defined as R(t) = []1normal normal normalΔPrPrfalse(0false) × 100where Δ P r is the change in remnant polarization during time, t . With this definition, 100% retention in the ferroelectric element at any t will be observed if Δ P r = P r (0) − P r ( t ), meaning that the state of polarization for the ferroelectric element has not changed.…”
Section: Resultsmentioning
confidence: 99%