Resolution improvement of ion projector with a low energy spread multicusp ion source

Bruenger, W. H.; Torkler, M.; Leung, K. N.; Lee, Y.; Williams, M. D.; Loeschner, Hans; Stengl, G.; Fallmann, W.; Paschke, F.; Stangl, G.; Rangelow, I. W.; Hudek, P.

doi:10.1016/s0167-9317(99)00044-1

Cited by 15 publications

(5 citation statements)

References 2 publications

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“…Two complementary masks are generally required with extremely tight alignment to produce, for example, line arrays. Although a sub-100 nm resolution has been demonstrated [61], problems such as source uniformity, space charge, wafer heating, and energy deposition in stencil masks remain to be studied. Ion beam lithography can also be performed as for shadow printing.…”

Section: Electron and Ion Projection Lithographymentioning

confidence: 99%

Nanofabrication: Conventional and nonconventional methods

2001

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Nanofabrication is playing an ever increasing role in science and technology on the nanometer scale and will soon allow us to build systems of the same complexity as found in nature. Conventional methods that emerged from microelectronics are now used for the fabrication of structures for integrated circuits, microelectro-mechanical systems, microoptics and microanalytical devices. Nonconventional or alternative approaches have changed the way we pattern very fine structures and have brought about a new appreciation of simple and low-cost techniques. We present an overview of some of these methods, paying particular attention to those which enable large-scale production of lithographic patterns. We preface the review with a brief primer on lithography and pattern transfer concepts. After reviewing the various patterning techniques, we discuss some recent application issues in the fields of microelectronics, optoelectronics, magnetism as well as in biology and biochemistry.

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Section: Electron and Ion Projection Lithographymentioning

confidence: 99%

Nanofabrication: Conventional and nonconventional methods

2001

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“…Ion projection direct cross-linking (IPDC) was used to locally cross-link skin layers of stretched polymer substrates on the submicrometer scale . The ion projector allows a vertical irradiation of substrate surfaces with a lateral resolution down to 50 nm . In our experiments, we irradiated square-shaped areas with 32 μm side lengths within the substrate surface with a separation of 12 μm.…”

Section: Introductionmentioning

confidence: 99%

Determination of Cross-Link Density in Ion-Irradiated Polystyrene Surfaces from Rippling

et al. 2009

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The irradiation of polymer surfaces with ion beams leads to pronounced chemical and physical modifications when the ions are scattered at the atoms in the polymer chain. In this way, different products of decomposition occur. Here we show that by changing the ion fluence and the mass of the ion the local mechanical properties as Young's modulus of a polystyrene surface layer can be tailored. By annealing prestretched irradiated PS near the glass transition, surface rippling occurs in the irradiated areas only, which can be described with an elastic model. The moduli obtained from rippling periodicities and elastic model assumptions are in the range between 8 and 800 MPa at the glass transition and characterize the irradiated PS as rubberlike. From these values the network density and the molar mass of entanglement are quantified. The obtained network density equals the density of hydrogen vacancies generated through the scattered ions, as confirmed by simulations of the atomic scattering and displacement processes. The obtained molar mass of entanglement reveals that the PS locally was densely cross-linked. Our results show that even for nondiscrete layered polymer systems relevant polymer parameters can be derived from the well-known surface rippling without the need for costly chemical analysis.

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“…Bruenger et al carried out exposures using He + ion beam projector on a Shipley UVII HS resist with resolution of 75nm [81]. The study of Lee et al [82] demonstrated that the lower the energy spread, the better the resolution and higher the aspect ratio of the printed structures.…”

Section: Projection Ion Beam Lithographymentioning

confidence: 99%

Nanomanufacturing of biopolymers using electron and ion beams

Jiang¹,

Qin²,

Tao³

2020

J. Micromech. Microeng.

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Precise patterning of polymer-based biomaterials for functional bionanostructures has extensive applications in biomimetics, biosensing, tissue engineering, and regenerative medicine. Here, we provide a critical review of recent progress in the nano-manufacture of biopolymers, including those for both natural and genetic purposes, with an emphasis on processing using electron and ion beams. In this review, we aim to provide in-depth coverage of nanomanufacturing processing technologies as well as the application of these new technologies. This will demonstrate how structural biopolymers, with silk proteins in particular as an example, can be considered as a material platform with a revolutionary impact in the biomedical, photonic and electronic fields.

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Resolution improvement of ion projector with a low energy spread multicusp ion source

Cited by 15 publications

References 2 publications

Nanofabrication: Conventional and nonconventional methods

Nanofabrication: Conventional and nonconventional methods

Determination of Cross-Link Density in Ion-Irradiated Polystyrene Surfaces from Rippling

Nanomanufacturing of biopolymers using electron and ion beams

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