Resistivity minima in disordered Co2FeAl0.5Si0.5 Heusler alloy thin films

Longchar, Lanuakum A.; Rahaman, Mainur; Hazra, Binoy Krishna; Rawat, R.; Raja, M. Manivel; Kaul, S. N.; Srinath, S.

doi:10.1016/j.jmmm.2023.170439

Cited by 5 publications

(1 citation statement)

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“…Extensive investigations have been carried out by our group on Co 2 FeSi (CFS) [14,15] and Co 2 FeAl 0.5 Si 0.5 (CFAS) [16] Heusler alloy thin films with major emphasis on the effect of site disorder and film thickness on magnetization dynamics, structural, magneto-optic, and magneto-transport properties. In these reports, the CFS and CFAS thin films were shown to crystallize in a cubic structure with B2 order even at a high deposition temperature of Ts = 550 • C.…”

Section: Introductionmentioning

confidence: 99%

Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co₂Fe_0.5Ti_0.5Si quaternary Heusler alloy thin films

Rahaman,

Longchar,

Lalita

et al. 2024

J. Phys. D: Appl. Phys.

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Ferromagnetic resonance and magneto-optic Kerr effect (MOKE) techniques are employed to unravel the nature of ‘in-plane’ (IP) magnetic anisotropy and magnetization reversal (MR) processes in magnetron-sputtered 100 nm Co2Fe0.5Ti0.5Si (CFTS) thin films, deposited (and subsequently annealed) at different substrate temperatures (Ts) ranging from 200°C to 550°C. By varying TS, the CFTS films are produced with different amounts of anti-site (AS) atomic disorder. Irrespective of the degree of AS disorder, the IP uniaxial magnetic anisotropy (UMA) is prevalent in all the CFTS films. The TS450 and TS500 films, deposited at TS = 450 oC and 500 oC, stand out as they have (i) the least AS disorder, (ii) lowest value (α = 0.0055) of the Gilbert damping constant, (iii) high saturation magnetization (≅ 770 ) at 300 K, (iv) UMAat300 K, (v) spin-wave stiffness (0 ≅ 175Å2 and, as in other CFTS films,the electron-magnon interaction is primarily responsible for the thermal renormalization of.Furthermore, in the TS450 and TS500 films, MOKE hysteresis loops at various angles ()

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Section: Introductionmentioning

confidence: 99%

Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co₂Fe_0.5Ti_0.5Si quaternary Heusler alloy thin films

Rahaman,

Longchar,

Lalita

et al. 2024

J. Phys. D: Appl. Phys.

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Effect of Si and Al on structural and physical properties of ternary and quaternary Co2Fe-based Heusler alloys

Jiraskova,

Bursik,

Gembalova

et al. 2024

Physica B: Condensed Matter

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Randomness driven reentrant cluster glass behavior and unconventional electrical transport in Ti2FeAl

P.,

Mukherjee

2024

Phys. Rev. B

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Resistivity minima in disordered Co2FeAl0.5Si0.5 Heusler alloy thin films

Cited by 5 publications

References 60 publications

Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co₂Fe_0.5Ti_0.5Si quaternary Heusler alloy thin films

Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co₂Fe_0.5Ti_0.5Si quaternary Heusler alloy thin films

Effect of Si and Al on structural and physical properties of ternary and quaternary Co2Fe-based Heusler alloys

Randomness driven reentrant cluster glass behavior and unconventional electrical transport in Ti2FeAl

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Resistivity minima in disordered Co2FeAl0.5Si0.5 Heusler alloy thin films

Cited by 5 publications

References 60 publications

Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co2Fe0.5Ti0.5Si quaternary Heusler alloy thin films

Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co2Fe0.5Ti0.5Si quaternary Heusler alloy thin films

Effect of Si and Al on structural and physical properties of ternary and quaternary Co2Fe-based Heusler alloys

Randomness driven reentrant cluster glass behavior and unconventional electrical transport in Ti2FeAl

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Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co₂Fe_0.5Ti_0.5Si quaternary Heusler alloy thin films

Effect of growth conditions on magnetization reversal and magnetic anisotropy in Co₂Fe_0.5Ti_0.5Si quaternary Heusler alloy thin films