2017
DOI: 10.1088/1361-6463/aa798a
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Resistive switching effect in the planar structure of all-printed, flexible and rewritable memory device based on advanced 2D nanocomposite of graphene quantum dots and white graphene flakes

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Cited by 37 publications
(26 citation statements)
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“…The surface morphology of boron nitride coatings was evaluated using scanning electron microscopy, as shown in Figure 5. As reported in our previous study [28], the morphology of hexagonal boron nitride grown without applied bias shows plate-like structures which have been reported for nanocrystalline h-BN [52,53]. In contrast, the bias-enhanced BN surface shows rounded nodules ~5µm diameter protruding from a very fine-grained base structure.…”
Section: Scanning Electron Microscopy (Sem)supporting
confidence: 79%
“…The surface morphology of boron nitride coatings was evaluated using scanning electron microscopy, as shown in Figure 5. As reported in our previous study [28], the morphology of hexagonal boron nitride grown without applied bias shows plate-like structures which have been reported for nanocrystalline h-BN [52,53]. In contrast, the bias-enhanced BN surface shows rounded nodules ~5µm diameter protruding from a very fine-grained base structure.…”
Section: Scanning Electron Microscopy (Sem)supporting
confidence: 79%
“…[60][61][62] Therefore, extensive research efforts have been devoted in exploring new functional materials for RRAM devices. Two-dimensional vdW materials-based RRAMs have received tremendous research attention over the past few years, [63][64][65] with the advantage of highly-scalable memory cells with low power consumption and fast switching speed. Several reports have explored the use of graphene either as a highly conductive electrode material or as an active layer in RRAM based NVM devices.…”
Section: Gate-tunable Memristive Phenomena In Atomically Thin Materialsmentioning
confidence: 99%
“…STT-MRAM has a drawback of reliability, while PCM has a disadvantage of an extensive write latency. Therefore, an alternative of a nonvolatile memory device for the next generation has been proposed by researchers in the form of resistive random-access memory (RRAM) devices with the advantages of low power consumption, high scalability, simple structure, easy fabrication, small size, and low cost. ,, ,,,, Applications of RRAMs include but are not limited to aerospace, chaotic circuits, neuromorphic computing, , memory devices, ,, ,, , and logical circuit displays. RRAMs are usually fabricated as a vertical device with a functional layer of an insulator/semiconductor sandwiched between two metallic electrodes; however, it can also have a planar structure. RRAMs can be further classified into nonvolatile and volatile memory devices on the basis of applied electric field, because nonvolatile memories can retain data even without the application of an external power supply, while volatile memories cannot retain their stored data in the absence of applied voltage. RRAMs usually operate reversibly with...…”
Section: Introductionmentioning
confidence: 99%