Preparing the thermal-sensitive thin films with high temperature coefficient of resistance (TCR) and low resistivity by a highly compatible process is favorable for increasing the sensitivity of microbolometers with small pixels. Here, we report an effective and process-compatible approach for preparing V 1-x-y Ti x Ru y O 2 thermal-sensitive thin films with monoclinic structure, high TCR, and low resistivity through a reactive sputtering process followed by annealing in oxygen atmosphere at 400°C. X-ray photoelectron spectroscopy demonstrates that Ti 4+ and Ru 4+ ions are combined into VO 2. X-ray diffraction, Raman spectroscopy, and transmission electron microscopy reveal that V 1-x-y Ti x Ru y O 2 thin films have a monoclinic lattice structure as undoped VO 2. But V 1-x-y Ti x Ru y O 2 thin films exhibit no-SMT feature from room temperature (RT) to 106°C due to the pinning effect of high-concentration Ti in monoclinic lattice. Moreover, RT resistivity of the V 0.8163 Ti 0.165 Ru 0.0187 O 2 thin film is only one-eighth of undoped VO 2 thin film, and its TCR is as high as 3.47%/°C.