2015
DOI: 10.1016/j.ijleo.2015.06.076
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Resistance hysteresis loop characteristic analysis of VO2 thin film for high sensitive microbolometer

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Cited by 8 publications
(5 citation statements)
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“…More importantly, VTRO-3 with low resistivity has large TCR (3.47%/°C), similar to undoped VO 2 thin film (VO). It is reasonable since semiconductor VO 2 with monoclinic structure generally exhibits large TCR [44]. As revealed by XRD, Raman, and TEM analyses, V 1-x-y Ti x Ru y O 2 thin films have same monoclinic structure as undoped VO 2 .…”
Section: High-concentration Ti Was Introduced Intomentioning
confidence: 79%
See 1 more Smart Citation
“…More importantly, VTRO-3 with low resistivity has large TCR (3.47%/°C), similar to undoped VO 2 thin film (VO). It is reasonable since semiconductor VO 2 with monoclinic structure generally exhibits large TCR [44]. As revealed by XRD, Raman, and TEM analyses, V 1-x-y Ti x Ru y O 2 thin films have same monoclinic structure as undoped VO 2 .…”
Section: High-concentration Ti Was Introduced Intomentioning
confidence: 79%
“…However, VO x thermal-sensitive thin films, which are generally prepared at relatively low temperature (lower than 300°C), are amorphous [3,7,8]. Whereas amorphous VO x tends to crystallize at elevated temperature [9]. Once the crystallization happens, electrical parameters of the film will be significantly changed.…”
Section: Introductionmentioning
confidence: 99%
“…Experimental VO 2 -based bolometers 66 69 have reported the operation by exploiting the semiconductor phase of VO 2 , i.e., at room temperature or normal temperatures well below the phase change (where TCR normal = 2–6% K −1 69 ). The cliff of the transition is not used experimentally, however, there are simulation 65 and modeling works 70 , 71 assuming TCR max upto 171% K −1 65 . Moreover, according to the experimental data of the transition edge bolometer in 66 , operating in the hysteresis region does not lead to any expected higher responsivity, but even half of the one when operated at T C R normal in periodic acquisition mode, due to formation of minor hysteresis loops and the loop accommodation process 66 .…”
Section: Introductionmentioning
confidence: 99%
“…The observed IMT voltage modulation was interpreted as field-induced enhancement of carrier density (Poole–Frenkel effect) succeeded by Joule heating due to electron-lattice coupling, which then stabilizes the metallic phase. For transition edge VO 2 bolometers, the lattice instabilities close to the phase-change temperature along with the local Joule heating can interfere with the bias control, as well as confining the dynamic range of the input 71 , 73 . In the device configuration of our work we are no more confronted by such instabilities and the power range can go broader (over a milli-watt) compared to that of bolometers (up to 20 μW 64 ).…”
Section: Introductionmentioning
confidence: 99%
“…Experimental VO 2based bolometers [39][40][41][42] have reported the operation by exploiting the semiconductor phase of VO 2 , i.e., at room temperature or normal temperatures well below the phase change (where TCR normal = 2 to 6 %K −142 ). The cliff of the transition is not used experimentally, however, there are simulation 38 and modeling works 43,44 assuming TCR max up to 171 %K −138 . Moreover, according to the experimental data of the transition edge bolometer in 39 , operating in the hysteresis region does not lead to any expected higher responsivity, but even half of the one when operated at TCR normal in periodic acquisition mode, due to formation of minor hysteresis loops and the loop accommodation process 39 .…”
Section: Introductionmentioning
confidence: 99%