Residual stress analysis in chemical-vapor-deposition diamond films

Liu, T.; Pinto, Haroldo Cavalcanti; Brito, Pedro; Sales, L. A.; Raabe, Dierk

doi:10.1063/1.3139083

Cited by 15 publications

(7 citation statements)

References 26 publications

(26 reference statements)

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“…[28] Our current EBSD results agree well with earlier XRD texture measurements. [15,16,20] In this study we particularly analyze the h001i, h110i, and h111i texture fibers including their primary twin components. For the analysis of these textures fiber components we consider a 108 orientation scatter.…”

Section: Microtexture Analysismentioning

confidence: 99%

“…[9] Various techniques have been used to study diamond film textures, namely, X-ray Bragg diffraction (XRD) for statistical texture analysis, [15,16] transmission electron microscopy (TEM) for defect studies, [17,18] and electron back-scattering diffraction (EBSD) for microtexture and twinning analysis. [16,19,20] However, a systematic investigation of the microtexture of diamond films, including parameter variations of substrate temperature, methane concentration, and film thickness, has not been conducted yet. In this work we investigate the texture and interfaces as a function of the deposition parameters during CVD (chemical vapor deposition) diamond film growth by means of a high-resolution (HR)-EBSD technique to understand the mechanisms that dominate the formation of thin film diamond textures.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Microtexture and Grain Boundaries in Freestanding CVD Diamond Films: Growth and Twinning Mechanisms

Liu

Raabe

Mao

et al. 2009

Adv Funct Materials

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Three groups of free‐standing chemical vapor deposition (CVD) diamond films formed with variations in substrate temperature, methane concentration, and film thickness are analyzed using high‐resolution electron back‐scattering diffraction. Primarily {001}, {110}, and {111} fiber textures are observed. In addition, corresponding primary and higher order twinning components are found. As interfaces, high angle, low angle, primary twin, and secondary twin boundaries are observed. A growth and a twinning model are proposed based on the sp3 hybridization of the bond in the CH4 molecule that is used as the deposition medium.

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Section: Microtexture Analysismentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Microtexture and Grain Boundaries in Freestanding CVD Diamond Films: Growth and Twinning Mechanisms

Liu

Raabe

Mao

et al. 2009

Adv Funct Materials

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“…N doping will enhance the diamond growth rate, and thereby reduce the production costs. The influence of nitrogen on the deposition rate has already been reported for both poly-and mono-crystalline diamond [3][4][5][6]. Recently, the effect by N on the CVD diamond growth rate enhancement has been studied using laser reflection interferometry [7].…”

Section: Introductionmentioning

confidence: 99%

Effect of CVD diamond growth by doping with nitrogen

Yi-Ming

Larsson

2013

Theor Chem Acc

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The purpose with the present investigation has been to support and explain the experimental observation made regarding the enhancing effect by N doping on especially the diamond (100)-2 9 1 growth rate. Within the present study, also the commonly observed diamond (111) and (110) surfaces were included, all assumed to be H-terminated. Density functional theory calculations were used, based on a plane wave approach under periodic boundary conditions. It was shown that the surface H abstraction reaction is most probably the rate-limiting step during diamond growth. In addition, the results showed that it is N, substitutionally positioned within the upper diamond surface, that will cause the growth rate improvement, and not nitrogen chemisorbed onto the growing surface in the form of either NH (or NH 2 ). The here presented numerical value for the growth rate enhancement for the diamond (100)-2 9 1 surface is almost identical with the experimentally obtained one (3.7 vs. 3.6). In addition, the (111) and (110) surfaces were shown to undergo a different growth rate enhancement, with about half as much for the (111) and (110) surfaces as compared to the diamond (100)-2 9 1 surface (1.9, 1.7 vs. 3.7). Despite the rate improvement for all surface planes, this difference will bring about a preferred diamond (100) surface texture.

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“…The above results show the substantial residual thermal stress in CVD-W coating, though optimization of the deposition parameters can obtain a possible reduction in the residual thermal stress. Thus, a large amount of efforts, such as the introduction of a transitional interlayer [13,14,20] and functionally gradient structures [5,21] have been performed during both experiments and numerical simulations to alleviate the residual thermal stress. In the previous work, a thin Ti coating (0.2 mm), with an intermediate CT E between those of W and Cu, and a high compliance, was chosen as the transition interlayer to investigate the influence of an interlayer from the aspects of experiments [14] .…”

Section: Effect Of Interlayermentioning

confidence: 99%

Analysis of Residual Thermal Stress in CVD-W Coating as Plasma Facing Material

Zhu¹,

Wang²,

Chen³

et al. 2012

Plasma Sci. Technol.

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Chemical vapor deposition-tungsten (CVD-W) coating covering the surface of the plasma facing component (PFC) is an effective method to implement the tungsten material as plasma facing material (PFM) in fusion devices. Residual thermal stress in CVD-W coating due to thermal mismatch between coating and substrate was successfully simulated by using a finite element method (ANSYS 10.0 code). The deposition parametric effects, i.e., coating thickness and deposition temperature, and interlayer were investigated to get a description of the residual thermal stress in the CVD-W coating-substrate system. And the influence of the substrate materials on the generation of residual thermal stress in the CVD-W coating was analyzed with respect to the CVD-W coating application as PFM. This analysis is beneficial for the preparation and application of CVD-W coating.

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Residual stress analysis in chemical-vapor-deposition diamond films

Cited by 15 publications

References 26 publications

Microtexture and Grain Boundaries in Freestanding CVD Diamond Films: Growth and Twinning Mechanisms

Microtexture and Grain Boundaries in Freestanding CVD Diamond Films: Growth and Twinning Mechanisms

Effect of CVD diamond growth by doping with nitrogen

Analysis of Residual Thermal Stress in CVD-W Coating as Plasma Facing Material

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