2007
DOI: 10.1016/j.ijleo.2006.04.013
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Research on micro-optical lenses fabrication technology

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Cited by 35 publications
(12 citation statements)
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“…The integral transformation performed by the GFL of thickness d is given by Eq. (11) where, in this case, ψ(x 0 , y 0 ) is the fundamental mode at the input face of the GFL, K is the PSF and ψ(x, y; d) is the mode field at the output face of the GFL. After the scaling operation by the GFL, a reproduction of the mode field of the first SMF on the input face of the second SMD is achieved.…”
Section: Grin Fiber Lensesmentioning
confidence: 99%
See 1 more Smart Citation
“…The integral transformation performed by the GFL of thickness d is given by Eq. (11) where, in this case, ψ(x 0 , y 0 ) is the fundamental mode at the input face of the GFL, K is the PSF and ψ(x, y; d) is the mode field at the output face of the GFL. After the scaling operation by the GFL, a reproduction of the mode field of the first SMF on the input face of the second SMD is achieved.…”
Section: Grin Fiber Lensesmentioning
confidence: 99%
“…The possibility of using GRIN materials in optical systems has been considered for many years, but the manufacture of materials has been the limiting factor in implementing GRIN optical elements and devices until the 1970s. In the last 30 years, however, many different gradient index materials have been manufactured by ion diffusion, ion-stuffing, sol-gel, CVD techniques and so on [7][8][9][10][11]. The revival of GRIN optics has not been casual and it is connected to a considerable degree with the enormous development of photonics elements mainly for optical communications system, sensing, and micro-optics [12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…Lithography using gray tone masks is another typical method [7,8]. In addition, etching methods [9][10][11], inkjet printing [12][13][14], and others [15][16][17] are also proposed.…”
Section: Introductionmentioning
confidence: 99%
“…Accordingly, in this study we proposed a structure of micro prism array that could separate two different kinds of image information to particular directions from one LC panel simultaneously. Using the processes of the three steps of lithography and the reactive ion etching will manufacture the profile of eight levels [7] [8]. The method uses binary optics and doesn't change inner structure of LC panel more.…”
Section: Introductionmentioning
confidence: 99%