The construction of high-speed electronic
devices that can be integrated
using a single two-dimensional (2D) semiconductor with high performance
remains challenging due to the absence of locally selective doping
methods. In this study, we have demonstrated that the selective opposite
polarities (p-type or n-type) from an intrinsic 2H-MoTe2 field-effect transistor (FET) can be configured through carrier
type band modulation in molybdenum ditelluride (MoTe2)
caused by the charge storage interface in MoTe2/BN vdW
heterostructures upon UV illumination with electrostatic gate bias.
With this approach, we demonstrate a lateral p-i-n homojunction diode
(p-MoTe2/intrinsic-MoTe2/n-MoTe2)
using a single two-dimensional semiconductor (2H-MoTe2)
where an intrinsic FET (i-type region) is sandwiched between p- and
n-type FETs. Electrical performance of such a p-i-n diode demonstrates
an ideal rectifying behavior with a rectification ratio (I
f/I
r) of up to ∼1.4
× 106 at zero gate bias with an ideal value of the
ideality factor of nearly ∼1. To support optoelectrical doping,
Kelvin probe force microscopy (KPFM) measurements are performed where
p- and n-type MoTe2 channels show work function values
of ∼5.0 and ∼ 4.55 eV, respectively, with a built-in
potential of ∼450 mV. In the photovoltaic mode, the p-i-n diode
shows excellent photodetection properties under an illumination of
600 nm, a maximum value of responsivity of 1.10 A/W, and a specific
detectivity value of 3.0 × 1012 Jones. The device
shows ultrafast photoresponses, where the response speed (τr/τf) is estimated to be 10/20 ns. The proposed
research offers an opportunity for creating stable p-i-n homojunction
diodes for high-speed electronics with low power consumption using
2D materials.