2004
DOI: 10.1063/1.1631068
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Reoxidation of silicon nitride studied using x-ray photoelectron spectroscopy and transmission electron microscopy

Abstract: Articles you may be interested inStudies of the oxidation states of phosphorus gettered silicon substrates using X-ray photoelectron spectroscopy and transmission electron microscopy J. Appl. Phys. 113, 044307 (2013); 10.1063/1.4775818Studies of W(100) modified by praseodymium oxide by using x-ray photoelectron spectroscopy, low-energy electron diffraction, and photoelectron emission microscopy

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Cited by 5 publications
(1 citation statement)
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“…111 The surface can be generally conditioned using standard approaches such as exposure to a suitable oxidizing or reducing environment, or wet etching including hydrofluoric acid (and analogues) or piranha solution (and analogues). 20,47,64,102,106,108,[114][115][116][117][118][119][120][121][122][123] Specialized extensions of these methods can bring additional chemical flexibility. 20,64,104 Silane chemistry is a common route to surface chemical functionalization, but one that can be undermined by insufficient attention to either the SiN x process history or to the demands of the silane reaction itself.…”
Section: Thin-film Silicon Nitride Membranesmentioning
confidence: 99%
“…111 The surface can be generally conditioned using standard approaches such as exposure to a suitable oxidizing or reducing environment, or wet etching including hydrofluoric acid (and analogues) or piranha solution (and analogues). 20,47,64,102,106,108,[114][115][116][117][118][119][120][121][122][123] Specialized extensions of these methods can bring additional chemical flexibility. 20,64,104 Silane chemistry is a common route to surface chemical functionalization, but one that can be undermined by insufficient attention to either the SiN x process history or to the demands of the silane reaction itself.…”
Section: Thin-film Silicon Nitride Membranesmentioning
confidence: 99%