Removal of thin layer for trace element analysis of solid surface in subnanometer scale using laser-ablation atomic fluorescence spectroscopy

Abstract

Laser-ablation atomic fluorescence (LAAF) spectroscopy has extremely high sensitivity in the analysis of trace elements. Using the ArF laser-ablation technique at a wavelength of 193 nm, removal of thin surface layer of the order of 1.1 nm/shot for the first 50 shots and 0.4 nm/shot after that is demonstrated for a solid glass sample. A constant fluorescence signal from Na atoms is obtained for each shot. There is a possibility of determining the depth distribution of an element with subnanometer resolution by applying LAAF spectroscopy.

Fabrication of HfO₂ Thin Film on Si Substrate by Double-Pulse Excitation PLD

“…Recently, many studies have examined double-pulse laser excitation, which is used in laser-induced fluorescence spectroscopy [1][2][3]. Double-pulse excitation (DPE) by two laser beams markedly improved the sensitivity by reheating the plume with different timing irradiation.…”

Nanometer-Scale Depth Resolution and Sensitive Surface Analysis Using Laser Ablation Atomic Fluorescence Spectroscopy

“…The nanometer removal of a glass and a polymeric sample was demonstrated by ArF excimer laser ablation (193 nm) with an ablation fluence just above the ablation threshold. 4,5) The nanometer ablation of metal and silicon matrices was also performed using a fs Ti:sapphire laser. 6) The combination of LAAF and nanometer-scale UV laser ablation was demonstrated for the first time using a sample of poly(methyl methacrylate) containing trace sodium methacrylate (Na:PMMA).…”