1999
DOI: 10.1109/16.777143
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Reliability testing of InP HEMT's using electrical stress methods

Abstract: In this paper, we discuss the results of three different electrical stress tests on InP-based HEMT's and their implications toward reliability. These are hot electron (HE) stress, transmission line pulse (TLP) measurements, and RF overdrive stress. Some processing parameters have been varied to investigate their influence on reliability issues. HE stress is performed on a set of Si 3 N 4 passivated devices with increasing recess width. Degradation is observed to be largely dependent on recess width, due to cha… Show more

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Cited by 15 publications
(2 citation statements)
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“…This provided a much greater understanding of the nature of the device degradation. However this approach can be improved by the use of an RF IV waveform measurement system, which measures the RF voltages and currents at the input and output terminals of the device, allowing the exact state of the device to be known during the stress period [5,8]. Here we extend this approach to produce a more complex step stress test [9].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…This provided a much greater understanding of the nature of the device degradation. However this approach can be improved by the use of an RF IV waveform measurement system, which measures the RF voltages and currents at the input and output terminals of the device, allowing the exact state of the device to be known during the stress period [5,8]. Here we extend this approach to produce a more complex step stress test [9].…”
Section: Introductionmentioning
confidence: 99%
“…Alternatively the second solution is to carry out the measurements at the intended operating frequency and then to use a de-embedding process to remove the displacement current caused by the drain-source capacitance (C DS ). This is the solution that we have used, along with several others [5][6][7], for the measurements presented in this paper and our previous work [8][9].…”
Section: Introductionmentioning
confidence: 99%