2014
DOI: 10.3390/mi5030570
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Reliability Investigation of GaN HEMTs for MMICs Applications

Abstract: Abstract:Results obtained during the evaluation of radio frequency (RF) reliability carried out on several devices fabricated with different epi-structure and field-plate geometries will be presented and discussed. Devices without a field-plate structure experienced a more severe degradation when compared to their counterparts while no significant correlation has been observed with respect of the different epi-structure tested. RF stress induced two main changes in the device electrical characteristics, i.e., … Show more

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Cited by 2 publications
(2 citation statements)
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“…[531] The degradation mechanism is field-driven, as suggested by tests on devices with and without field-plates. [532] A RF stress usually induces small variations in the DC performance of state-of-the art devices, mainly a lowering of the saturation current and a decrease in gate leakage, [533] but the generation of defects causes an increase in the dynamic current collapse. [534] A negative [535] or positive [536] shift in threshold voltage is also observed sometimes, due to the presence of traps in the cap and barrier layer.…”
Section: Rf Stressmentioning
confidence: 99%
“…[531] The degradation mechanism is field-driven, as suggested by tests on devices with and without field-plates. [532] A RF stress usually induces small variations in the DC performance of state-of-the art devices, mainly a lowering of the saturation current and a decrease in gate leakage, [533] but the generation of defects causes an increase in the dynamic current collapse. [534] A negative [535] or positive [536] shift in threshold voltage is also observed sometimes, due to the presence of traps in the cap and barrier layer.…”
Section: Rf Stressmentioning
confidence: 99%
“…However, thanks to the benefits of wide band gap technology, some of these challenges will soon be overcome if more research goes into solving the respective problems. Recently, the field of power electronic devices has awakened to the wide band gap technology and this has resulted in the birthing of the high electron mobility transistors (HEMTs) [ 149 , 150 , 151 , 152 , 153 , 154 , 155 , 156 , 157 , 158 , 159 , 160 , 161 , 162 , 163 , 164 , 165 , 166 , 167 , 168 , 169 , 170 ]. These transistors, mostly MOSFETs and IGBTs, are made from materials such as silicon carbide (SiC), gallium nitride (GaN), indium phosphide (InP), aluminum gallium nitride (AlGaN), etc.…”
Section: Discussionmentioning
confidence: 99%