Abstract:InAlAs was oxidized by UV and ozone process. Nanometer-order thin-oxide layers were generated in proportion to the square root of the process period, although their correlation with the period is poor compared with that of InGaAs. Oxidation initially decreased photoluminescence intensity from the InAlAs surface and then gradually increased it when the process period exceeded 15 min until it reached 4 h (crystallographic-order degradation followed by recovery). Plasma nitridation of InAlAs exhibited a gradual a… Show more
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