2023
DOI: 10.1016/j.scriptamat.2022.115050
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Relationship between resistive switching and Mott transition in atomic layer deposition prepared La2Ti2O7-x thin film

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Cited by 5 publications
(3 citation statements)
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“…This indicates that the ferroelectric field induced carriers do not significantly influence the photoresistance of the ESMO film, and the photoresistance is tuned by the strain effect. The above experimental results indicate that the tunable Several models have been proposed so far to explain the mechanism of resistive switching, including Mott transition [31,32], Schottky barrier behavior at interfaces [33,34], electric field-induced generation lattice strain [35,36], and oxygen vacancy diffusion [37]. According to our experimental results, in ESMO/PMN-PT heterojunctions, the resistive switching mainly arises from the lattice strain effect and the polarization current effect.…”
Section: Resultssupporting
confidence: 70%
“…This indicates that the ferroelectric field induced carriers do not significantly influence the photoresistance of the ESMO film, and the photoresistance is tuned by the strain effect. The above experimental results indicate that the tunable Several models have been proposed so far to explain the mechanism of resistive switching, including Mott transition [31,32], Schottky barrier behavior at interfaces [33,34], electric field-induced generation lattice strain [35,36], and oxygen vacancy diffusion [37]. According to our experimental results, in ESMO/PMN-PT heterojunctions, the resistive switching mainly arises from the lattice strain effect and the polarization current effect.…”
Section: Resultssupporting
confidence: 70%
“…Very recently, Wang et al reported voltage-driven and V O doping-controlled Mott transition in atomic-layer-deposited La 2 Ti 2 O 7−x (LTO) film on TiN substrate [ 142 ]. The mixed valence states of Ti ion (Ti 4+ and Ti 3+ ) and the composition of La versus Ti (1.07) in the pristine LTO film were confirmed by X-ray photoelectron spectroscopy.…”
Section: Recent Studies On Filament-free Switching Memristorsmentioning
confidence: 99%
“…In most studies, X-ray photoelectron spectroscopy (XPS) has been used to analyse the N species in LTO and examine the electronic states. 9,15,16,21 However, there is an issue with the inconsistent peak assignments of N-doped LTO in the N 1s XPS spectra. Most reports attribute the peak at approximately 399 eV to the Ti-O-N bond, 19,[22][23][24][25][26][27] whereas some attribute it to the Ti-N bond.…”
Section: Introductionmentioning
confidence: 99%