As practice has shown, the most erratic, environmentally friendly, and easily controllable way of optical element treatment is the electron-beam method. However, the widespread use of electron beam technology in optoelectronic instrumentation is hampered by the lack of methods for determining optimal modes of electron beam microprocessing of optical elements, representing a set of controlled parameters of the electron beam (current of the beam Ib 50…300 mА, accelerating voltage Vу 4…8 kV, distances to the treated surface l 610 -2 … 810 -2 m, beam movement speed V 510 -2 …510 -3 m/s, heat exposure time t 0.3…1.0 s), excess of which leads to a number of undesirable phenomena, that harm the quality of the surfaces to be treated.There have been developed the mathematical models of the process of heating elements from optical glass and ceramics of various geometric shapes and sizes (thin film elements, thin plates of high size) by a moving belt electron beam, which allow to calculate the influence of its parameters on temperature fields in treated elements. It was established that the increase in the Ib and Vу parameters in the specified ranges leads to an increase in the maximum surface temperature of optical elements by more than 2 times, and the decrease in the parameters l and V by less than 1.5 times. Optimal values of the parameters of the electron beam are determined, the excess of which leads to the appearance of cracks and splits in the surface layers of elements, violation of their geometric shape and deterioration of the metrological characteristics of the devices up to their failure.