1980
DOI: 10.1143/jjap.19.839
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Reduction of Metal Oxides by Electron Cyclotron Resonance (ECR) Plasma of Hydrogen–A Model Study on Discharge Cleaning

Abstract: The angular distribution of electrons from autoionising states is derived, taking into account fine and hyperfine structure. Partially unresolved structures of the decaying state lead to a depolarisation of the anisotropy of the angular distribution. A detailed investigation of this effect is presented and applied to various coupling schemes important for the analysis of experimental data.

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Cited by 16 publications
(3 citation statements)
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“…Experiments with mirrors of different types have added much to the results of paper [79] concerning the efficiency of removing oxide films of different thickness (δ) through the use of low-temperature hydrogen plasma, as is shown in Table 4. All new data (for BeO, Al 2 O 3 , WO 3 in comparison with the ones of ref [79]) were obtained by applying optical and ellipsometric methods in experiments with metal mirrors (Be, Al, W) and film mirrors (Al, Ag) protected with a dielectric film (Al 2 O 3 , ZrO 2 ).…”
Section: Removal Of Metal Oxidesmentioning
confidence: 99%
See 1 more Smart Citation
“…Experiments with mirrors of different types have added much to the results of paper [79] concerning the efficiency of removing oxide films of different thickness (δ) through the use of low-temperature hydrogen plasma, as is shown in Table 4. All new data (for BeO, Al 2 O 3 , WO 3 in comparison with the ones of ref [79]) were obtained by applying optical and ellipsometric methods in experiments with metal mirrors (Be, Al, W) and film mirrors (Al, Ag) protected with a dielectric film (Al 2 O 3 , ZrO 2 ).…”
Section: Removal Of Metal Oxidesmentioning
confidence: 99%
“…All new data (for BeO, Al 2 O 3 , WO 3 in comparison with the ones of ref [79]) were obtained by applying optical and ellipsometric methods in experiments with metal mirrors (Be, Al, W) and film mirrors (Al, Ag) protected with a dielectric film (Al 2 O 3 , ZrO 2 ). The data of Table 4 testify that copper oxide is the most easily removable film, while zirconium oxide film appears the most stable.…”
Section: Removal Of Metal Oxidesmentioning
confidence: 99%
“…Using hydrogen directly to reduce Cu oxide in the form of plasma is preferred since hydrogen plasma is known to be effective in reducing Cu oxide. 19) There have been many ways to exploit hydrogen plasma, [20][21][22][23][24] but only few research studies have been carried out for low-temperature Cu-Cu bonding, [25][26][27][28] which is important for three-dimensional (3D) IC applications, especially wafer-level manufacturing processes. 29) We expected that hydrogen plasma could both reduce surface oxide and activate the surface, which are critical for lowtemperature Cu-Cu bonding.…”
Section: Introductionmentioning
confidence: 99%