Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer<sup>TM</sup>

Hellgren, Jonas; Fosshaug, Hans; Österberg, Anders; Ivansen, Lars

doi:10.1117/12.681743

Cited by 5 publications

(3 citation statements)

References 17 publications

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“…radial error from the developer. The following two sections provide a general description of ProcessEqualizer, but it is described in more technical detail in a previous paper 9 . As with all compensation methods, it requires the possibility of predicting CD variations before the pattern is printed.…”

Section: Funtional Descriptionmentioning

confidence: 99%

“…Global and local loading effects especially during plasma etching [3][4][5][6] , but also to a lesser degree during develop 7,8 , have gained increased interest in the mask community recently. With the ProcessEqualizer function 9 , the Sigma7500 provides a means of compensating for static process CD signatures as well as pattern-density dependent CD errors arising from mask developing and dry etching.…”

Section: Introductionmentioning

confidence: 99%

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Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Eklund

Österberg

Hellgren

et al. 2007

23rd European Mask and Lithography Conference

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Managing the total CD error in advanced mask manufacturing requires that error contributions from writing, process and metrology are minimized. This paper describes how both the writing and process contributions have been addressed in the Sigma7500 DUV laser pattern generator, which prints masks by imaging a programmable spatial light modulator (SLM). System enhancements have reduced the writing contribution to global CD uniformity to 5 nm (3s). Processrelated CD error sources, such as the signatures from mask developing and etching can be significant contributors to the total CD error in mask manufacturing. These errors are classified as being either pattern-independent or patterndependent, and the effects of both can be reduced using the ProcessEqualizer feature of the Sigma7500. This software tool performs CD sizing during writing based on pattern density maps derived during mask data preparation, along with tunable parameters that are determined experimentally. The CD sizing function has no effect on system throughput and does not require flattening and re-fracturing of the pattern data.

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Section: Funtional Descriptionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Eklund

Österberg

Hellgren

et al. 2007

23rd European Mask and Lithography Conference

Self Cite

View full text Add to dashboard Cite

show abstract

“…Global and local loading effects, especially during plasma etching, but also to a lesser degree during develop, have recently gained increased attention in the mask community. With the ProcessEqualizer™ function 6,7 , the Sigma7500 provides a means of compensating for static process CD signatures as well as pattern-density dependent CD errors arising from mask developing and dry etching.…”

Section: Bias Functionsmentioning

confidence: 99%

Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC

et al. 2007

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Optical proximity correction (OPC) is widely used in wafer lithography to produce a printed image that best matches the design intent while optimizing CD control. OPC software applies corrections to the mask pattern data, but in general it does not compensate for the mask writer and mask process characteristics. The Sigma7500-II deep-UV laser mask writer projects the image of a programmable spatial light modulator (SLM) using partially coherent optics similar to wafer steppers, and the optical proximity effects of the mask writer are in principle correctable with established OPC methods.To enhance mask patterning, an embedded OPC function, LinearityEqualizer™, has been developed for the Sigma7500-II that is transparent to the user and which does not degrade mask throughput. It employs a Calibre™ rule-based OPC engine from Mentor Graphics, selected for the computational speed necessary for mask run-time execution. A multinode cluster computer applies optimized table-based CD corrections to polygonized pattern data that is then fractured into an internal writer format for subsequent data processing. This embedded proximity correction flattens the linearity behavior for all linewidths and pitches, which targets to improve the CD uniformity on production photomasks.Printing results show that the CD linearity is reduced to below 5 nm for linewidths down to 200 nm, both for clear and dark and for isolated and dense features, and that sub-resolution assist features (SRAF) are reliably printed down to 120 nm. This reduction of proximity effects for main mask features and the extension of the practical resolution for SRAFs expands the application space of DUV laser mask writing.

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Improved photomask accuracy with a high-productivity DUV laser pattern generator

et al. 2006

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Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer^TM

Cited by 5 publications

References 17 publications

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC

Improved photomask accuracy with a high-productivity DUV laser pattern generator

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Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizerTM

Cited by 5 publications

References 17 publications

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC

Improved photomask accuracy with a high-productivity DUV laser pattern generator

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Product

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Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer^TM