2013
DOI: 10.4071/isom-2013-wa12
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Redistribution Layers (RDLs) for 2.5D/3D IC Integration

Abstract: Redistribution layer (RDL) is an integral part of 3D IC integration, especially for 2.5D IC integration with a passive interposer. The RDL allows for fans out of the circuitries and allows the lateral communication between the chips attached to the interposer. There are at least two ways to fabricate the RDL, namely (a) polymers to make the passivation and Cu-plating to make the metal layer, and (b) semiconductor back-end-of-line Cu damascene. In this study, the materials and processes of these methods are pre… Show more

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Cited by 16 publications
(4 citation statements)
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“…RDLs are usually fabricated by combining photolithographic processes with sputtering and plating. [ 294 ] Employing FOWLP for MEMS sensor packaging has some unique challenges, particularly if delicate devices such as capacitive micromachined ultrasound transducers are involved. The RDL must be removed above the membrane to ensure proper functionality of the sensor.…”
Section: Applicationsmentioning
confidence: 99%
“…RDLs are usually fabricated by combining photolithographic processes with sputtering and plating. [ 294 ] Employing FOWLP for MEMS sensor packaging has some unique challenges, particularly if delicate devices such as capacitive micromachined ultrasound transducers are involved. The RDL must be removed above the membrane to ensure proper functionality of the sensor.…”
Section: Applicationsmentioning
confidence: 99%
“…Redistribution layers [104][105][106][107] are the most integral part of wafer-level packaging (WLP). The RDL consists of two layers, the dielectric layer and the Cu conducting layer.…”
Section: Redistribution Layers Fabricationsmentioning
confidence: 99%
“…29. This is called the dual Cu-damascene method [104,105]. Finally, repeat all the processes to get the other RDLs.…”
Section: Journal Of Electronic Packagingmentioning
confidence: 99%
“…The 2.5D/3D Integrated packaging is seen as an effective technology to satisfy the requirements, e.g., higher input/output (I/O) density, excellent signal integrity, and outstanding heat dissipation, for nano/micro electronic systems [8][9][10][11]. The bump, through silicon via (TSV) and redistribution layer (RDL), comprises the essential components for 2.5D/3D integrated devices [12][13][14]. Among them, the functions of electric conduction, thermal conduction, and mechanical connection between TSV and RDL were realized by bumps.…”
Section: Introductionmentioning
confidence: 99%